Roughness characterization in positive and negative resists

Direct e-beam lithography of PDMS

“…It has a unique combination of properties including excellent thermal and chemical stability and non-toxicity making it an attractive material for use in many fields of science, especially in biomedical research [1]. Its sensitivity to electron radiation [2] has lead to its use as a resist for subsequent substrate patterning [3] albeit generally in a modified form [4][5][6]. Here we analyze the effects of exposing liquid PDMS to electron radiation over a large range of doses on the resulting elastic modulus and topography.…”

Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists

“…[4][5][6][7][8][9] However, it cannot be reduced below a certain value when exposure dose is increased. 10,11) This phenomenon is also a reason why many people believe the LER limit.…”

Resist Materials and Processes for Extreme Ultraviolet Lithography

“…[44][45][46][47][48][49] Equations (2) and (3) indicate that LER is inversely proportional to the square root of exposure dose. Experimental studies on the exposure dose dependence of LER demonstrated that LER decreases with increasing exposure dose.…”

“…Experimental studies on the exposure dose dependence of LER demonstrated that LER decreases with increasing exposure dose. [44][45][46][47] However, it cannot be reduced below a certain value (3-4 nm) when exposure dose is increased. 50,51) A common explanation of this lower limit of LER upon high-dose exposure is that it is of material origin, namely, it is associated with the molecular size and/ or high-order interaction of polymers.…”