SAXS Analysis of the Order−Disorder Transition and the Interaction Parameter of Polystyrene-<i>block</i>-poly(methyl methacrylate)

Zhao, Yue; Sivaniah, Easan; Hashimoto, Takeji

doi:10.1021/ma8013004

Cited by 134 publications

(180 citation statements)

References 37 publications

Supporting

Mentioning

174

Contrasting

Order By: Relevance

“…However, the minimum feature size that can be achieved by orientation of PS-b-PMMA is approximately 13 nm since the χ parameter for PS-b-PMMA is only 0.037 at 150°C, the temperature near which the system is typically annealed [9]. Furthermore, the etch selectivity between PS and PMMA is not high [10].…”

Section: Introductionmentioning

confidence: 99%

Block Copolymer Orientation Control Using a Top-Coat Surface Treatment

Seshimo¹,

Bates²,

Dean³

et al. 2012

J. Photopol. Sci. Technol.

View full text Add to dashboard Cite

Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block.

show abstract

Section: Introductionmentioning

confidence: 99%

Block Copolymer Orientation Control Using a Top-Coat Surface Treatment

Seshimo¹,

Bates²,

Dean³

et al. 2012

J. Photopol. Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…[32] Based on the estimates of χ PS-PMMA given in the literature [33], we estimate the segregation χN H 19.…”

Section: Self-consistent Field Theory -Model Descriptionmentioning

confidence: 99%

Modeling Chemoepitaxy of Block Copolymer Thin Films using Self-Consistent Field Theory

Ginzburg

Weinhold

Hustad³

et al. 2013

J. Photopol. Sci. Technol.

View full text Add to dashboard Cite

Directed self-assembly (DSA) of block copolymers (BCPs) is a promising technology for advanced patterning at future technology nodes. We use Self-Consistent Field Theory (SCFT) to model directed self-assembly (DSA) of PS-PMMA block copolymers on chemically patterned surfaces (chemoepitaxy). We consider the scenario in which the surface is covered by a neutral brush, in which PS-preferential guiding lines are written. The lines have width W and the period of the line pattern is denoted as P. After the DSA process, one expects to see a lamellar pattern with period (P/n), where n is the line multiplication factor. Using SCFT, we investigate the stability of the templated lamellar pattern as a function of (P/L 0 ) and (W/L 0 ), where L 0 is the bulk lamellar period. We find that the pattern is most stable if the guiding stripe pattern has a width which is slightly larger than the equilibrium lamellar half-period, and roughly corresponds to (W/L 0 ) = 0.5--0.6, in agreement with earlier studies. The stability of the pattern also depends on the multiplication factor, n; as n is increased, the free energy differences between various morphologies diminish, making the formation of defects more likely. This has significant impact on the practicality of chemoepitaxy for sub-30 nm line and space applications.

show abstract

“…Therefore, it was not until two years ago that a direct measurement of the lamellae-disorder transition temperature for PS-b-PMMA had appeared in the literature. 8 Meanwhile, the present author and co-workers reconsidered the whole problem for PS-b-PMMA. 9 They measured SAXS for the disordered copolymer and those exhibiting ordering transition temperatures with finely tuned molecular weights.…”

Section: Introductionmentioning

confidence: 97%

“…Very recently, Hashimoto and co-workers reported χ for hydrogenated PS-b-PMMA by using small-angle X-ray scattering (SAXS) that χ is also entropically dominated as before as χ =0.0282+4.46/T. 8 For the corresponding blends, it was also reported by Callaghan and Paul 7 that χ=0.021+3.2/T. Stühn 6 gave a slightly different result for the copolymer that χ= 0.035+8.8/T.…”

Section: Introductionmentioning

confidence: 99%

“…For the last two decades, χ for this system has been known to possess a strong entropic a with a weak enthalpic b. [5][6][7][8] It was not until a year ago that a hidden truth regarding χ for this system was found: 9 For the PS-b-PMMA copolymer melt of M n =20,000, χ S-MMA at lower temperatures was shown to be similar to literature values, but that at higher temperatures reveals a strong enthalpic b on the contrary. Further investigation of order-disorder transition temperatures for the copolymers of various chain sizes was found to support also the enthalpically domi-…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation