2010
DOI: 10.1016/j.sse.2009.09.010
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Schottky barrier nano-MOSFET with an asymmetrically oxidized source/drain structure

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Cited by 16 publications
(3 citation statements)
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“…With continued research and development microelectromechanical systems (MEMS) are finding their way into many commercial applications. The applications cover a wide range from modern electronics [1][2][3][4] to optoelectronics [3,4] and mechanical systems such as sensors [5,6] and actuators [7]. Some common examples include carbon nanotubes, carbon nanofibers [8], nanostructured anti-reflection coatings [4], phononic crystals [6,9], micromirror arrays [10], and MEMS gyroscopes [5].…”
Section: Introductionmentioning
confidence: 99%
“…With continued research and development microelectromechanical systems (MEMS) are finding their way into many commercial applications. The applications cover a wide range from modern electronics [1][2][3][4] to optoelectronics [3,4] and mechanical systems such as sensors [5,6] and actuators [7]. Some common examples include carbon nanotubes, carbon nanofibers [8], nanostructured anti-reflection coatings [4], phononic crystals [6,9], micromirror arrays [10], and MEMS gyroscopes [5].…”
Section: Introductionmentioning
confidence: 99%
“…In particular, an FET with asymmetric Schottky (rectifying) source and ohmic drain is called a Schottky tunneling source (STS) FET. [5][6][7][8] STS FET is an alternative device structure to overcome problems related to the advanced scaling of the S/D. Its operation principle is carrier injection by field emission (FE) to the channel under a strong accumulation state induced by the gate voltage (V G ), as shown in Fig.…”
Section: Introductionmentioning
confidence: 99%
“…14) To overcome these problems, several strategies have been reported with simulation and experimental results. [15][16][17][18][19][20][21][22][23][24][25] Hu et al and Asra et al have suggested enlarging the tunneling area by increasing the gate-source overlap will be one of the solutions for boosting the I on . [26][27][28] However, the requirement of additional area for the gate-source overlap and the SCE makes it difficult to reduce the device size.…”
Section: Introductionmentioning
confidence: 99%