SCREEN's DT-3000 track-booster system: how can hardware improve EUV performance?

Santos, Andreia Mendes dos; Tanaka, Yuji; Asai, Masaya; Harumoto, Masahiko; Zanders, Wesley; Vandereyken, Jelle; Verstraete, Lander; Rathore, Ashish; Suh, Hyo Seon

doi:10.1117/12.2643150

Cited by 1 publication

(3 citation statements)

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“…Metal oxide resist (MOR) platforms have gained significant attention over the past years due to its substantial advantages when applied to (high-NA) EUV lithography. 2,4,6 Continuous monitoring and improvement of the track performance remains key to assure reliable MOR processing. During this study, we identified an enhanced process alternative for the development of MOR with a significant dose reduction while still assuring good print quality AEI.…”

Section: Discussionmentioning

confidence: 99%

“…Further efforts are needed to enhance sensitivity without compromising patterning quality. 2,4,5 To address this, an initial assessment is carried out to evaluate the defect levels and process stability of the materials used for MOR processing, installed on SCREEN's Lithospin DT-3000 track at imec. We conduct weekly monitoring of added defects on silicon wafers and track the film thickness (FT) of coating materials.…”

Section: Introductionmentioning

confidence: 99%

“…These advancements underscore the continued importance of hardware innovation in the semiconductor manufacturing landscape and its indispensable role in supporting the transition to high-NA EUVL technology, ensuring high-quality and reliable production. 1,2,3…”

mentioning

confidence: 99%

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Enhancing process stability and defect control in advanced EUV lithography via innovative track systems

Caron,

Santos,

Zanders

et al. 2024

Advances in Patterning Materials and Processes XLI

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In the ever-evolving landscape of semiconductor manufacturing, ensuring impeccable process stability and defect control remains crucial in modern lithography. These elements have driven the maturation of the entire extreme ultraviolet (EUV) lithography ecosystem, which is now geared to meet the upcoming challenges. A critical component of this ecosystem is the lithography track, whose performance capabilities have been evolving rapidly to keep pace with technology roadmap advancements.In this study, we present the capabilities of novel hardware solutions integrated into SCREEN's DT-3000 coat-develop track system when applied to metal oxide resist (MOR) platforms. We demonstrate how hardware development remains a fundamental driver for enhancing not only process stability and defect control but also for optimizing additional critical metrics such as resolution, line width roughness (LWR), defect-free window, and pattern shape. These advancements underscore the continued importance of hardware innovation in the semiconductor manufacturing landscape and its indispensable role in supporting the transition to high-NA EUVL technology, ensuring high-quality and reliable production. 1,2,3

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Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%