2017
DOI: 10.1186/s11671-017-1924-0
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Selective-Area Growth of Transferable InN Nanocolumns by Using Anodic Aluminum Oxide Nanotemplates

Abstract: InN nanocolumn arrays were grown on c-plane sapphire with and without anodic aluminum oxide (AAO) nanotemplates. The crystalline quality of InN nanocolumns was significantly improved by selective-area growth (SAG) using AAO templates, as verified by X-ray diffraction measurements. Then, InN nanocolumns were transferred onto p-type silicon substrates after etching off the AAO templates. Current–voltage characteristic of the transferred n-InN/p-Si heterojunctions shows on/off ratio as high as 4.65 × 103 at 2 V. … Show more

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Cited by 5 publications
(2 citation statements)
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“…[6,7] Moreover, Cremophor EL often causes adverse effects such as hypersensitivity, neurotoxicity, and nephrotoxicity. [8] Conse-quently, in the past few decades, various methods, including the use of PTX-coated nanoparticles, [9][10][11][12][13] polymers, [14,15] inorganic nanomaterials, [16,17] prodrugs, [17] and mesoporous silica nanoparticles, [18][19][20][21] have been developed to improve the anticancer efficacy of PTX.…”
Section: Introductionmentioning
confidence: 99%
“…[6,7] Moreover, Cremophor EL often causes adverse effects such as hypersensitivity, neurotoxicity, and nephrotoxicity. [8] Conse-quently, in the past few decades, various methods, including the use of PTX-coated nanoparticles, [9][10][11][12][13] polymers, [14,15] inorganic nanomaterials, [16,17] prodrugs, [17] and mesoporous silica nanoparticles, [18][19][20][21] have been developed to improve the anticancer efficacy of PTX.…”
Section: Introductionmentioning
confidence: 99%
“…In molecular beam epitaxy (MBE), the growth of InN nanorods with a good selectivity was achieved. However, it is very difficult to control the morphological shape with a well-defined aspect ratio because of the complexity of InN growth kinetics. The perfect SAG of vertically aligned InN nanorods with a high aspect ratio was newly demonstrated thanks to the hydride vapor-phase epitaxy (HVPE) process . The SAG was performed on SiN-masked Ga-polar GaN/c-Al 2 O 3 templates with circular openings of 200 nm.…”
Section: Introductionmentioning
confidence: 99%