Selective area oxidation of silicon with a scanning force microscope

Day, H. C.; Allee, David R.

doi:10.1063/1.109259

Cited by 231 publications

(137 citation statements)

References 11 publications

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“…In 1993 it was demonstrated that local oxidation experiments could be performed with an atomic force microscope. 16 This Fig. 1 Scheme of some common mechanisms to modify surfaces with scanning probe nanolithographies.…”

Section: Local Oxidation Nanolithographymentioning

confidence: 99%

See 1 more Smart Citation

Nano-chemistry and scanning probe nanolithographies

García¹,

Martínez²,

Martínez³

2006

Chem. Soc. Rev.

361

306

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The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.

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Section: Local Oxidation Nanolithographymentioning

confidence: 99%

“…They serve as a good model to illustrate some of the fundamental aspects involved in the local oxidation process. [16][17][18][19] Voltage pulses are applied to generate an oxide dot. The dot size depends linearly on voltage strength but the dot height shows a power law dependence of the type…”

Section: Local Oxidation Nanolithographymentioning

confidence: 99%

Nano-chemistry and scanning probe nanolithographies

García¹,

Martínez²,

Martínez³

2006

Chem. Soc. Rev.

361

306

View full text Add to dashboard Cite

show abstract

“…The oxide is used as an etch mask so that two-dimensional patterns can be transferred into the silicon. For lithographic purposes the process has been demonstrated using a scanning tunneling microscope ͑STM͒, 1-5 an atomic force microscope ͑AFM͒, 6,7 and electron beam lithography. 4,8 More recently, optically induced hydrogen desorption was reported.…”

Section: Introductionmentioning

confidence: 99%

Oxidation of hydrogen-passivated silicon surfaces by scanning near-field optical lithography using uncoated and aluminum-coated fiber probes

Madsen

Bozhevolnyi

Birkelund

et al. 1997

Journal of Applied Physics

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Optically induced oxidation of hydrogen-passivated silicon surfaces using a scanning near-field optical microscope was achieved with both uncoated and aluminum-coated fiber probes. Line scans on amorphous silicon using uncoated fiber probes display a three-peak profile after etching in potassium hydroxide. Numerical simulations of the electromagnetic field around the probe–sample interaction region are used to explain the experimental observations. With an aluminum-coated fiber probe, lines of 35 nm in width were transferred into the amorphous silicon layer.

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“…[7][8][9][10][11][12][13][14] Recently this field has experienced a renovated interest. For one side, several results have contributed to an increased understanding of the oxidation mechanism in silicon surfaces 15,16 and its kinetics.…”

Section: Introductionmentioning

confidence: 99%

Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges

García¹,

Calleja²,

Rohrer³

1999

Journal of Applied Physics

201

156

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Nanometer-size water bridges have been used to confine the oxidation of silicon surfaces with a noncontact atomic force microscope. The formation of a water bridge between two surfaces separated by a gap of a few nanometers is driven by the application of an electrical field. Once a liquid bridge is formed, its length and neck diameter can be modified by changing the tip-sample separation. The liquid bridge provides the ionic species and the spatial confinement to pattern Si͑100͒ surfaces in noncontact force microscopy. The method is applied to write arrays of several thousands dots with a periodicity of 40 nm and an average width of 10 nm.

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Selective area oxidation of silicon with a scanning force microscope

Cited by 231 publications

References 11 publications

Nano-chemistry and scanning probe nanolithographies

Nano-chemistry and scanning probe nanolithographies

Oxidation of hydrogen-passivated silicon surfaces by scanning near-field optical lithography using uncoated and aluminum-coated fiber probes

Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges

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