Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs)

Wohlfart, Peter; Weiβ, Jurij; Käshammer, Josua; Winter, Carl; Scheumann, Volker; Fischer, Roland A.; Mittler‐Neher, Silvia

doi:10.1016/s0040-6090(98)01366-2

Cited by 37 publications

(46 citation statements)

References 14 publications

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“…The other reason for growing undesirable Au NPs is that it is statistically possible that the gaseous Au precursor is initially adsorbed to form a nucleus, and then additional Au is bound to it. [46,48] The layer of Au deposited on the inner walls of the OMCVD chamber confirms this interpretation.…”

Section: Resultsmentioning

confidence: 59%

“…Here, nucleation and growth only occur on so-called growth areas (thiol groups). [48] It is also an economical, environmentally friendly and a soft method as the deposition process takes place under low pressure and relatively low temperature, and avoids solution or airborne nanoparticles. The aggregation state of the particles can be controlled because the particles are immobilized on the surface and fixed in their morphology.…”

Section: Introductionmentioning

confidence: 99%

“…The emptied surfaces in the OTS resist can be refilled by MPTS for Au NP growth. [46,48] The result of this ion lithography should be a pattern of OMCVD grown Au NPs with a dose controlled average spacing.…”

Section: Introductionmentioning

confidence: 99%

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Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Rezaee

Davidson

Manifar

et al. 2009

Surface & Interface Analysis

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One application of octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) is its use as thin film resists. In this work, we demonstrated that OTS SAMs can be reliable resists for organo-metallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs). In optical sensing applications based on Au NPs, one candidate system consists of patterned OTS SAMs and precisely grown OMCVD Au NPs for achieving a high sensitivity. As an initial step, the OTS SAMs need to perfectly resist the OMCVD Au NP growth. Hence the optimized formation of the OTS SAMs affected by different assembly times and baking temperatures was studied by contact angle, ellipsometry, XPS, SEM, and atomic force microscopy (AFM). To demonstrate the ability of the OTS SAMs to resist OMCVD Au NP growth, the OMCVD process was carried out on two sets of samples: OTS SAMs fabricated under optimized conditions on one set and the other set without OTS SAMs. High-resolution XPS, RBS, SEM, and ultraviolet-visible (UV-Vis) spectroscopy were applied to study the growth of Au NPs on the samples with and without OTS SAM resists.

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Section: Resultsmentioning

confidence: 59%

Section: Introductionmentioning

confidence: 99%

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Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Rezaee

Davidson

Manifar

et al. 2009

Surface & Interface Analysis

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“…For Au CVD an organogold complex, (trimethylphosphine)methylgold(I) ((Me3P) AuCH 3 ), has been used with the result of selective deposition on ÀSH and ÀCH 3 terminated SAMs maintained at 70 C [81][82][83]. Further, CVD at 70 C on SAMs with ÀSH, ÀCH 3 , and ÀOH terminal groups was studied by spectroscopic and microscopic analyses with the result that no penetration was observed for the-SH surface but was observed for the -CH 3 and -OH surfaces.…”

Section: Aumentioning

confidence: 99%

Issues and Challenges in Vapor-Deposited Top Metal Contacts for Molecule-Based Electronic Devices

Maitani

2011

Unimolecular and Supramolecular Electronics I

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Metal vapor deposition to form ohmic contacts is commonly used in the fabrication of organic electronic devices because of significant manufacturability advantages. In the case of single molecular layer devices, however, the extremely small thickness, typically ~1-2nm, presents serious challenges in achieving good contacts and device integrity. This review focuses on recent scientific aspects of metal vapor deposition on monolayer thickness molecular films, particularly self-assembled monolayers, ranging across mechanisms of metal nucleation, metal-molecular group interactions and chemical reactions, diffusion of metal atoms within and through organic films, and the correlations of these and other factors with device function. Results for both non-reactive and reactive metal deposition are reviewed. Finally, novel strategies are considered which show promise for providing highly reliable and durable metal/organic top contacts for use in metal-molecule-metal junctions for device applications.

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“…Whether the binding of the thiol groups, or the van der Waals interactions between the alkyl chains leading to well-ordered structures, is the dominating effect depends on the particular system and the conditions employed. [23±29] It has previously been shown by XPS [30] and AFM [11] that 1,8-octanedithiol (OCDT) can form nicely ordered SAMs on gold and silver, yielding a surface which is terminated by thiol functions. We were able to prepare OCDT SAMs on silver, and to confirm the XPS results.…”

Section: Growth Of Au On Thiol-terminated Samsmentioning

confidence: 99%

Selective Nucleation and Area-Selective OMCVD of Gold on Patterned Self-Assembled Organic Monolayers Studied by AFM and XPS: A Comparison of OMCVD and PVD

Winter

Weckenmann

Fischer

et al. 2000

Chem. Vap. Deposition

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We demonstrate the area selective organometallic chemical vapor deposition (OMCVD) of ultrathin gold layers, using (trimethylphosphine)methylgold [(CH 3 ) 3 P]AuCH 3 as the gold source, onto self-assembled monolayers (SAMs) of x-functionalized, long chain alkanethiols on gold and silver coated silicon and mica samples. The dependence on the reaction time of surface coverage with gold nano-clusters is analyzed by atomic force microscopy (AFM). X-ray photoelectron spectroscopy (XPS) shows that nucleation and growth occur only on thiol functionalized surfaces and not on methyl or hydroxyl functionalized SAMs. The selectivity of the growth is completely lost if gold is deposited by thermal evaporation of the pure metal, as shown in direct comparison with the OMCVD method employing mixed SAMs of different surface reactivity (±SH vs. ±CH 3 ) that were patterned by microcontact printing.

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Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs)

Cited by 37 publications

References 14 publications

Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

Issues and Challenges in Vapor-Deposited Top Metal Contacts for Molecule-Based Electronic Devices

Selective Nucleation and Area-Selective OMCVD of Gold on Patterned Self-Assembled Organic Monolayers Studied by AFM and XPS: A Comparison of OMCVD and PVD

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