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We demonstrate the area selective organometallic chemical vapor deposition (OMCVD) of ultrathin gold layers, using (trimethylphosphine)methylgold [(CH 3 ) 3 P]AuCH 3 as the gold source, onto self-assembled monolayers (SAMs) of x-functionalized, long chain alkanethiols on gold and silver coated silicon and mica samples. The dependence on the reaction time of surface coverage with gold nano-clusters is analyzed by atomic force microscopy (AFM). X-ray photoelectron spectroscopy (XPS) shows that nucleation and growth occur only on thiol functionalized surfaces and not on methyl or hydroxyl functionalized SAMs. The selectivity of the growth is completely lost if gold is deposited by thermal evaporation of the pure metal, as shown in direct comparison with the OMCVD method employing mixed SAMs of different surface reactivity (±SH vs. ±CH 3 ) that were patterned by microcontact printing.

We demonstrate the deposition of Al x O y H z onto hydroxy-terminated self-assembled monolayers. The layer structure is investigated by Fourier transform infrared (FTIR) spectroscopy, spontaneous desorption time-of-flight mass spectrometry, and surface plasmon spectroscopy. It is found that the organic self-assembled monolayer remains intact during deposition and the film thickness of the aluminum oxide and hydroxide films can be adjusted by varying the deposition time. The new aluminum hydroxide surface was used for a second self-assembly process with dodecanoic acid.

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