“…Vacuum-based physical vapor deposition (PVD) techniques, such as reactive magnetron sputtering [15,[17][18][19], are commonly favored, however, they can be cost-prohibitive and require specialized equipment and expertise, making them less suitable for smallscale applications. As a result, wet-chemical methods, particularly the sol-gel-based techniques, are preferred, especially in research-scale applications, due to their simplicity, cost-effectiveness, and ability to deposit films without the need for high-vacuum conditions [16,20,21]. In sol-gel deposition, the coating is initially formed from a liquid sol formulation, applied to the substrate using techniques like dip-coating or spin coating, and subsequently converted to the desired metal oxide via post-deposition heat-treatment step [22].…”