“…4(a)). The chlorination behavior of SiOC materials observed in the present study are well consistent with the Brisebourg et al [51] in which the authors showed that mixed SiC x O 4Àx environments in silicon oxycarbide tend to destabilize the structure and enhance the Si-sites chlorination. In that sense, the pore size in the residual C is probably related to the SiC x O 4Àx (0 < x < 4) domain size from which it originates.…”