2016
DOI: 10.1002/advs.201600078
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Side‐Gated In2O3 Nanowire Ferroelectric FETs for High‐Performance Nonvolatile Memory Applications

Abstract: A new type of ferroelectric FET based on the single nanowire is demonstrated. The design of the side‐gated architecture not only simplifies the manufacturing process but also avoids any postdeposition damage to the organic ferroelectric film. The devices exhibit excellent performances for nonvolatile memory applications, and the memory hysteresis can be effectively modulated by adjusting the side‐gate geometries.

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Cited by 43 publications
(19 citation statements)
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“…These ferroelectric materials have been favored to fabricate electronic devices such as nonvolatile memory and negative capacitance field effect transistors (NCFETs), owing to the spontaneous electric polarization and external electric field controlled ferroelectric hysteresis. Additionally, they can be appropriate gate dielectric to tune the carrier transport in the channel of field effect transistors (FETs) …”
Section: Six Types Of Localized Fieldsmentioning
confidence: 99%
“…These ferroelectric materials have been favored to fabricate electronic devices such as nonvolatile memory and negative capacitance field effect transistors (NCFETs), owing to the spontaneous electric polarization and external electric field controlled ferroelectric hysteresis. Additionally, they can be appropriate gate dielectric to tune the carrier transport in the channel of field effect transistors (FETs) …”
Section: Six Types Of Localized Fieldsmentioning
confidence: 99%
“…Due to their chemical stability, excellent crystallinity, and low-cost synthesis, metal oxide nanowires (NWs) can improve device performance through enhanced gate capacitance coupling. Thus, multiple electronic devices have been demonstrated based on one-dimensional (1D) semiconductor NWs, such as sensors, diodes, resistors, memory units, photodetectors, solar cells, and field-effect transistors (FETs). , Among these metal oxide NWs, In 2 O 3 , with a high field-effect carrier mobility, wide band gap (∼3.6 eV), controllable electrical properties, and good metal–semiconductor contact, is a promising active material for integrated nanoscale electronics. , …”
mentioning
confidence: 99%
“…Since the negative capacitance state is intrinsically unstable, efforts have been made to experimentally explore the negative capacitance effect. ,− Although 2D materials have attracted researchers for their numerous advantages, the environment sensitivity and the interfacial effects often involve passivation layer deposition for a stable performance. Moreover, the nondangling bonds also lead to the challenges for dielectric deposition. , Hence, it is desirable to assemble steep slope FETs based on 1D metal oxide NWs with high performance and stability. Simpler device processing is better for low-cost, energy-saving, and high-efficiency technologies.…”
mentioning
confidence: 99%
“…Two-dimensional metal oxides have an extensive application as optical, electronic, and sensing semiconductors. Compared with a large number of one-dimensional metal oxide-based FET biosensors reported [ 113 , 114 ], 2D metal oxide-based FET biosensors still have a large space in FET biosensors applications. Herein, we briefly introduce several metal oxide-based FET biosensors.…”
Section: Non-carbon 2d Materialsmentioning
confidence: 99%