Silicon nitride and oxynitride films deposited from organosilicon plasmas: ToF–SIMS characterization with multivariate analysis

A comparison of structures and properties of SiNx and SiOx films prepared by PECVD

“…3. This implies the yield of amorphous materials by PECVD, similar to what previously produced [5,6].…”

“…Many methods have been exploited to adjust the residual stress in SiNx films. One method widely used is to carefully optimize the deposition conditions, including temperature, substrate, gas flow, pressure, source frequency, power, etc [5][6][7]. In addition, low stress SiNx films can be yielded by using some modified systems, such as catalytical CVD (Cat-CVD) [30] and dualfrequency PECVD (DF-PECVD) [31].…”

“…as light absorption layers, passivation layers, supporting layers, diffusion barriers, or dielectric materials, for microelectronic and optoelectronic devices [3][4][5]. Many techniques have been developed to prepare SiNx films, one utilized widely in both research and industry is plasma-enhanced chemical vapor deposition (PECVD) [5,6]. The main advantage of PECVD is that SiNx or SiOx films can be deposited at a temperature of 25-300°C [5], which is much lower than that (≥700°C) in low pressure chemical vapor deposition (LPCVD) process [7].…”

Organic-Inorganic Behavior of Plasma-Polymerized Hexamethyldisiloxane Films Studied by Electron and Photon Induced Ion Desorption

“…Similar to other reported ESID analysis of organic compounds H + ion is the main species desorbed after electron bombardment, followed by heavier fragments with lower intensity. Peak assignment of the siloxane fragments in the ESID spectra (Table ) was performed considering the TOF‐SIMS results and ESID spectra obtained with low energy electrons (energy ≤70 eV) previously reported. F + and F 2+ peaks found in the HDMSO_2 ESID spectrum is probably due to silver paint contribution, used to maintain the electrical contact.…”

Distribution of Gadolinium in Rat Heart Studied by Fast Field Cycling Relaxometry and Imaging SIMS

“…Biological tissues could lose their biomarker distribution if chemical fixation treatments are applied. By avoiding chemical fixation, ToF-SIMS analysis of biomarked tissues provides significant advantages and has been successfully used in the study of both surfaces and thin coatings [3,4,5,6,7], polymeric and biological samples [8,9,10], as well as biomarkers and cellular component distribution [11,12,13,14,15]. ToF-SIMS was widely used to obtain images of biological materials and tissues, like heart, brain, liver, etc.…”