The X-ray beam expander for advanced synchrotron sources based on Si planar compound parabolic refractive lenses (CRLs) with aperture of 10 micron was considered. The lenses were fabricated by using MEMS technologies including a lithography and a deep silicon etching for CRLs pattern generation in the hard mask and the pattern transfer into silicon wafer down to 40 μm, respectively. To minimize an influence of the manufacturing errors on the CRLs optical properties special control and metrology of the geometrical parameters of the lenses were proposed and applied. The errors influence on the X-ray beam expander parameters was considered theoretically and the related computer simulations were performed.