Simulated plasma immersion ion implantation processing of thin wires

Abstract

Particle-in-cell simulation of an electron shock wave in a rapid rise time plasma immersion ion implantation process Phys. Plasmas 12, 043503 (2005); 10.1063/1.1872894Numerical simulation of metal plasma-immersion ion implantation and deposition on a cone Simulation of sheath dynamics and current nonuniformity in plasma-immersion ion implantation of a patterned surface In plasma immersion ion implantation, the dependencies of sheath expansion and ion flux density on substrate geometry are well established. However, effects of extreme diameter variations have not been investigated explicitly. Using an analytical simulation code assuming an infinite mean free path, the sheath expansion, ion flux density, and resulting substrate temperature are explored down to wire diameters of 150 m. Comparing the results for planar substrates and cylindrical, thin wires, a reduction in the sheath width up to a factor of 10, a faster establishing of a new equilibrium sheath position, and an increase in the ion fluence by a factor of 100 is encountered. The smaller plasma sheath allows for a denser packing of wires during the treatment than for planar substrates. Additionally, the implantation time is reduced, allowing a fast wire transport through the chamber, further increasing the throughput.

Sheath expansion of two-dimensional grid electrodes subjected to short pulses of negative high-voltage

“…Plasma sheath expansions of electrodes subjected to negative high-voltage have been studied in various electrode configurations [1,2,[4][5][6][7][8][9][10][11][12][13][14][15][16][17] for basic plasma science research and industrial plasma applications. For the one-dimensional (1D) configurations, analytic models have been well established for sheath expansions.…”

“…Scheuer developed a model for the case of fast sheath expansion and applied the model to 1D planar, cylindrical, and spherical electrodes [2]. These models were modified and improved by many researchers [4,5] and are used in recent research [6,7]. Two-dimensional (2D) or three-dimensional (3D) electrode configurations have also been investigated [11][12][13][14][15][16][17], but the methods of approach are different from those used for 1D configurations.…”

Numerical analysis of monoenergetic electrons energy effect on dynamic potential profile of plasma sheath

“…The study of sheath formation at the boundary of the plasma is of great practical importance. In plasma immersion ion implantation (PIII) (Mändl et al 1997;Sheridan et al 1998;Zeng et al 1999;Qi et al 2000;Bilek 2001;Yukimura 2001;Mukherjee et al 2002;Kwok et al 2003;Lacoste and Pelletier 2003;Masamune and Yukimura 2003;Ma et al 2003;Rauschenbach and Mändl 2003;Tian et al 2004Tian et al , 2005Tian et al , 2009Meige et al 2005;Sakudo et al 2006;Ghomi et al 2007Ghomi et al , 2009Huang et al 2007;Li and Wang 2007;Mukherjee et al 2007;Ghomi and Ghasemkhani 2009;Lejars et al 2010;Li et al 2010Li et al , 2012Zhu et al 2011), a plasmacontaining species to be implanted into a substrate is generated by an external plasma source or by the negative bias applied to the substrate (Conrad et al 1987;Meige et al 2005). After the negative bias is applied, electrons are repelled away from the surface leaving heavy ions forming an ion matrix sheath.…”