2008
DOI: 10.1007/s00542-007-0495-x
|View full text |Cite
|
Sign up to set email alerts
|

Simulation of a novel lateral axis micromachined gyroscope in the presence of fabrication imperfections

Abstract: This paper proposes a method to simulate a lateral axis micromachined gyroscope in the presence of two kinds of fabrication imperfections using finite element simulation. Non-ideal performances caused by lateral overetching are simulated by modal analysis. Beam width variations are simulated by harmonic analysis. Simulation and discussion of the asymmetric motion caused by beam width variations show the advantage of our design with doubly decoupled structure and special arrangement of sensing capacitors.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2008
2008
2017
2017

Publication Types

Select...
6
1

Relationship

1
6

Authors

Journals

citations
Cited by 8 publications
(4 citation statements)
references
References 5 publications
0
4
0
Order By: Relevance
“…In the simulation, it was assumed that the drive direction is perfectly aligned to the axis which is not the case in the fabricated device leading to quadrature error. Additionally, asymmetric defects lead to an increase of mechanical cross coupling [16], therefore common mode errors do not ideally cancel as intended by the design; this further increases the mechanical cross coupling.…”
Section: Implementation and Experimental Resultsmentioning
confidence: 99%
“…In the simulation, it was assumed that the drive direction is perfectly aligned to the axis which is not the case in the fabricated device leading to quadrature error. Additionally, asymmetric defects lead to an increase of mechanical cross coupling [16], therefore common mode errors do not ideally cancel as intended by the design; this further increases the mechanical cross coupling.…”
Section: Implementation and Experimental Resultsmentioning
confidence: 99%
“…DRIE typically results in footing and sidewall etching problems because of the non-uniform etch rate [16]. For example, as shown in figures 3(a)-(d), regions in which the silicon layer has been completely etched may be attacked, while other parts of the wafer are yet to be perforated; this can lead to non-vertical sidewalls and artifacts around the foot of the trench.…”
Section: Robustness To Fabrication Tolerancesmentioning
confidence: 99%
“…Previously, effect of fabrication imperfections in MEMS gyroscopes is investigated through developing the theoretical models from the lumped-mass-spring systems (Gyimesi and Ketal 2004;Zhang et al 2006) but these have limitations in analyzing the asymmetric defects and imperfections along with the many approximations made in developing the theoretical models. Nodal analysis and finite element method (FEM) based simulations (Ha et al 2006;Iyer and Mukherjee 2002;Xiao et al 2004;Bo et al 2008;Han and Kwak 2001) have been used to address the fabrication induced asymmetric defects. But difficulty in building 3D models with the nodal analysis method and the time consuming FEM simulations make these approaches generally impractical for complex structured MEMS gyroscopes.…”
Section: Introductionmentioning
confidence: 99%