Simulation of DOE fabrication using DMD-based gray-tone lithography

Guo, Xiaowei; Du, Jinglei; Guo, Yongkang; Du, Chunlei; Cui, Zheng; Yao, Jun

doi:10.1016/j.mee.2006.01.100

Cited by 10 publications

(4 citation statements)

References 8 publications

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“…The binary pulse width modulation technique (PWM) switches the micromirror and controls the switchtime. Switching the micromirror on and off controls the tilt angle of the micromirror at +12° and -12°, respectively [22]. The switchtime is modulated by the pulse width.…”

Section: Grayscale Maskmentioning

confidence: 99%

Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure

Huang

Jeng

2012

Journal of the Optical Society of Korea

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This study discusses photoresist forming using a composite grayscale to fabricate a Fresnel lens. Grayscale lithography is a common production method used to facilitate the forming of lenses with different curvatures and depths. However, this approach is time consuming and expensive. This study proposes a method for overcoming these obstacles by integrating a digital micromirror device and microscope to supplant the traditional physical grayscale mask. This approach provides a simple and practical maskless optical lithography system. According to the results, the two adjacent grayscales displayed substantial differences between the high grayscale and influence the low grayscale that ultimately affected photoresist formation. Furthermore, we show that change of up to 150% in the slope can be achieved by changing the grayscale gradient in the central zone and the ring profile. The results of the optical experiment show a focus change with different gray gradients.

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Section: Grayscale Maskmentioning

confidence: 99%

Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure

Huang

Jeng

2012

Journal of the Optical Society of Korea

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“…In addition, some scholars modelled the light intensity distribution of a single DMD mirror using the Fraunhofer diffraction of rectangular aperture 13 . Guo et al developed a partially coherent imaging model for the DMD-based lithography using the Hopkins' method, which considered the grayscale characteristics of DMD 15 . Similarly, Shi et al jointly used the Hopkins method and Abbe method to propose a fast partially coherent imaging model for DMD-based lithography 16 .…”

Section: Introductionmentioning

confidence: 99%

Mask correction for DMD-based lithography testbed with calibrated imaging model

Huang,

Ma,

Zhang

et al. 2024

International Conference on Optics and Machine Vision (ICOMV 2024)

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Digital micromirror device (DMD) based lithography system, which generates the mask pattern via a spatial light modulator, is increasingly applied in micro-nano fabrication due to its high flexibility and low cost. However, the exposure image is subject to distortion because of the optical proximity effect and the non-ideal system conditions. Correcting mask pattern with calibrated imaging model is an essential approach to improve the image fidelity of DMD-based lithography system. This paper introduces an imaging model calibration method for the DMD-based lithography testbed established by our group. The error convolution kernel and the point spread function in the imaging model are optimized using the batch gradient descent algorithm to fit a set of training data, which represent the impacts of non-ideal imaging process of the DMD-based lithography testbed. Based on the calibrated imaging model, the steepest descent algorithm is used to correct the mask pattern, thus improving the image fidelity of the testbed. Experiments demonstrate the effectiveness of the proposed model calibration method. It also shows that the size of error convolution kernel significantly influences the accuracy of the calibrated imaging model within a certain range. Finally, the effectiveness of the mask correction method is proved by experimental results.

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“…Compared with the physical mask, digital mask lithography has a lower pattern transfer efficiency. When performing micron lithography on large-area patterns, the principle of projection lithography system based on DMD [ 7 ] is shown in Figure 1 a. The system is composed of light source, DMD, optical system (Fourier lens, Fourier filter, reduction lens), software system, 3D mobile platform, etc.…”

Section: Introductionmentioning

confidence: 99%

Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography

Wang

Han

et al. 2020

Entropy

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In the process of digital micromirror device (DMD) digital mask projection lithography, the lithography efficiency will be enhanced greatly by path planning of pattern transfer. This paper proposes a new dual operator and dual population ant colony (DODPACO) algorithm. Firstly, load operators and feedback operators are used to update the local and global pheromones in the white ant colony, and the feedback operator is used in the yellow ant colony. The concept of information entropy is used to regulate the number of yellow and white ant colonies adaptively. Secondly, take eight groups of large-scale data in TSPLIB as examples to compare with two classical ACO and six improved ACO algorithms; the results show that the DODPACO algorithm is superior in solving large-scale events in terms of solution quality and convergence speed. Thirdly, take PCB production as an example to verify the time saved after path planning; the DODPACO algorithm is used for path planning, which saves 34.3% of time compared with no path planning, and is about 1% shorter than the suboptimal algorithm. The DODPACO algorithm is applicable to the path planning of pattern transfer in DMD digital mask projection lithography and other digital mask lithography.

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Simulation of DOE fabrication using DMD-based gray-tone lithography

Cited by 10 publications

References 8 publications

Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure

Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure

Mask correction for DMD-based lithography testbed with calibrated imaging model

Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography

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