Simulation of temperature and gas density field distribution in diamond films growth on silicon wafer by hot filament CVD

Zhang, Tao; Zhang, Jianguo; Shen, Bin; Sun, Fanghong

doi:10.1016/j.jcrysgro.2012.01.005

Cited by 40 publications

(20 citation statements)

References 16 publications

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“…The HFCVD apparatus comprised eight tantalum filaments with a diameter and a length of 0.15 and 100 mm, respectively. Maintaining the gases at a high temperature was necessary to decompose the gases into radicals for growth . To maintain a high temperature over the long distance for enhancement of the growth precursor, the two‐layer filaments were arranged, as shown in Figure .…”

Section: Methodsmentioning

confidence: 99%

High‐Rate Growth of Single‐Crystalline Diamond (100) Films by Hot‐Filament Chemical Vapor Deposition with Tantalum Filaments at 3000 °C

Tabakoya

Kanada

Wakui

et al. 2019

Physica Status Solidi (a)

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Single-crystalline (100) diamond films are grown using hot-filament chemical vapor deposition at 3000 C for the first time, which is achieved using tantalum filaments. A high growth rate of 10 μm h À1 is achieved, which is %50 times faster than that achieved at 2000 C. The Raman spectrum of the diamond film grown at high rate shows a peak at 1333 cm À1 with a full-width at halfmaximum of 2.8 cm À1 , which is comparable with that of the seed substrate (2.7 cm À1 ). The surfaces of grown films are smooth, without hillocks or nonepitaxial crystallites.

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Section: Methodsmentioning

confidence: 99%

High‐Rate Growth of Single‐Crystalline Diamond (100) Films by Hot‐Filament Chemical Vapor Deposition with Tantalum Filaments at 3000 °C

Tabakoya

Kanada

Wakui

et al. 2019

Physica Status Solidi (a)

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“…Hydrogen gas flowed into the chamber through the inlet and out of it from the outlet. The properties of materials used in the FEM model are listed in table 2 [29][30][31][32][33][34][35]. The constructed FEM model was meshed, consisting of 174, 791 elements.…”

Section: Fem Simulationsmentioning

confidence: 99%

A novel approach of deposition for uniform diamond films on circular saw blades

Zhou

Yuan

Lyu

et al. 2017

Plasma Sci. Technol.

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Uniform diamond films are highly desirable for cutting industries, due to their high performance and long lifetime used on cutting tools. Nevertheless, they are difficult to obtain on cutting tools with complicated shapes, greatly limiting the applications of diamond films. In this study, a novel approach of deposition for uniform diamond films is proposed, on circular saw blades made of cemented carbide using reflectors of brass sheets. Diamond films are deposited using hot filament chemical vapor deposition (HFCVD). A novel concave structure of brass sheets is designed and fabricated, improving the distribution of temperature field, and overcoming the disadvantages of the conventional HFCVD systems. This increases the energy efficiency of use without changing the structure and increasing the cost of HFCVD. The grains are refined and the intensities of diamond peaks are strengthened obviously, which is confirmed by scanning electron microscopy and Raman spectra respectively.

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“…A mixture of acetone and excessive hydrogen is used as the reactant gas, with trimethyl borate (B(CH 3 O) 3 ) predoped in the acetone as the boron addition. Tantalum wires are adopted as hot filaments, parameters of which are optimized according to the previous study 28 in order to obtain uniform substrate temperature field distribution on plane substrate surfaces (filament number ¼ 6, diameter ¼ 0.8 mm, filament separation ¼ 17 mm, filament-substrate distance ¼ 9 mm). A direct current bias is applied between the filament and substrate to enhance the nucleation density during the deposition processes.…”

Section: Deposition and Characterization Of The Bdd Filmsmentioning

confidence: 99%

Erosive wear performance of boron-doped diamond films on different substrates

Wang

Cui

Zhang

et al. 2013

Proceedings of the Institution of Mechanical Engineers, Part J:

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Diamond films have been considered as good candidate protective coatings on varieties of substrates in order to improve their erosive wear performance. In the present study, boron-doped diamond films with thicknesses of about 6-7 mm are first deposited on five different substrates using the hot filament chemical vapor deposition method, including SiC, WC-Co, Ta, Ti, and Si substrates. The residual stress and adhesive strength of the five boron-doped diamond films are estimated, respectively, by means of material properties of substrates and the diamond, Raman spectra, and static indentation results. Erosion tests are conducted on all the boron-doped diamond coated samples in an air-sand erosion rig with angular SiC sands as erodents. The results exhibit that the formation of ring cracks on the boron-doped diamond film in the erosion process has a strong link to the total residual stress. The higher residual compressive stress in the Ti-based boron-doped diamond film can slow down the formation of ring cracks to some extent. Nevertheless, the erosive wear performance, which is mainly evaluated based on the erosion rate and film removal, is much related to the filmsubstrate adhesion. As a result, the Ti-based boron-doped diamond film is quickly worn and removed because of the poorest adhesion. On the contrary, both the SiC-and Si-based boron-doped diamond films with favorable adhesion perform much better erosion resistance. Moreover, comparative erosion tests on thicker SiC-and WC-Co-based boron-doped diamond films (21-23 mm) and their applications on nozzles can both further manifest the same kind of relationship, the SiC-based boron-doped diamond film presenting longer steady erosive stage and slower film removal than the WC-Co-based one.

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Simulation of temperature and gas density field distribution in diamond films growth on silicon wafer by hot filament CVD

Cited by 40 publications

References 16 publications

High‐Rate Growth of Single‐Crystalline Diamond (100) Films by Hot‐Filament Chemical Vapor Deposition with Tantalum Filaments at 3000 °C

High‐Rate Growth of Single‐Crystalline Diamond (100) Films by Hot‐Filament Chemical Vapor Deposition with Tantalum Filaments at 3000 °C

A novel approach of deposition for uniform diamond films on circular saw blades

Erosive wear performance of boron-doped diamond films on different substrates

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