Comprehensive Hard Materials 2014
DOI: 10.1016/b978-0-08-096527-7.00050-7
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Single-Ion Implantation in Diamond with a High Lateral Resolution

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Cited by 7 publications
(3 citation statements)
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“…These results pave the way for a fascinating and feasible implementation of the Kane proposal for a scalable, solid-state, spin-based quantum processor. , As sketched in Figure a, an H-terminated and transparent diamond surface would mute all NV based electron spins below as already discussed above (see Figure ). By adding insulated, nanoscopic top gates selected NV centers might be switched back into NV – upon request.…”
mentioning
confidence: 62%
“…These results pave the way for a fascinating and feasible implementation of the Kane proposal for a scalable, solid-state, spin-based quantum processor. , As sketched in Figure a, an H-terminated and transparent diamond surface would mute all NV based electron spins below as already discussed above (see Figure ). By adding insulated, nanoscopic top gates selected NV centers might be switched back into NV – upon request.…”
mentioning
confidence: 62%
“…The SRIM program does not take into account ion channeling effects, ion diffusion, phase transformation of the target material, or the possibility of defect curing (particularly at high temperatures); therefore, it may overestimate the level of damage . Ion channeling is not expected to occur in our case due to the random orientation of the diamond crystallites.…”
Section: Results and Discussionmentioning
confidence: 99%
“…The possibility to develop diamond optoelectronic devices with stable, room-temperature, electrically driven single-photon sources is a key technology with a broad range of application ranging from quantum communication, computing and metrology [2]. The electrical control of the charge state of NV centers in diamond requires the control of the Fermi level in the diamond band-gap, which has been successfully achieved by incorporating the luminescent center in an intrinsic diamond layer sandwiched between graphitic/graphitic electrodes [3] or in p-i-n structures with graphitic ohmic contacts [4][5] [6]. However, for the optimization of these devices and their standardization in the perspective of their large scale production, an accurate and spatially resolved characterization of their electrostatic features is essential.…”
Section: Introductionmentioning
confidence: 99%