2008
DOI: 10.1016/j.mejo.2007.07.116
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Single-peak excitonic emission of CdSe ultra-thin quantum wells finished with fractional monolayers

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Cited by 18 publications
(5 citation statements)
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“…In particular, CdSe, CdSe x Te (1 À x) and Cd x Zn (1 À x) Se alloys have been used as active optical region in low dimensional structures based on ultra thin quantum wells [1][2][3][4] and quantum dots [5]. The growth of CdSe strained epilayers on ZnSe has been relatively difficult due to the small critical thickness (less than 4 monolayers) [for an overview see [1,2,6]; on the other hand, relaxed layers exhibit structural defects and high density of dislocations near the interface due to lattice mismatch [7].…”
Section: Introductionmentioning
confidence: 99%
“…In particular, CdSe, CdSe x Te (1 À x) and Cd x Zn (1 À x) Se alloys have been used as active optical region in low dimensional structures based on ultra thin quantum wells [1][2][3][4] and quantum dots [5]. The growth of CdSe strained epilayers on ZnSe has been relatively difficult due to the small critical thickness (less than 4 monolayers) [for an overview see [1,2,6]; on the other hand, relaxed layers exhibit structural defects and high density of dislocations near the interface due to lattice mismatch [7].…”
Section: Introductionmentioning
confidence: 99%
“…[23][24][25] Higher Cd contents can be obtained only by reducing the QW thickness as is the case of ultrathin CdSe/ZnSe QWs with subnanometric thicknesses in the 1-3 MLs range. [15,26]…”
Section: Resultsmentioning
confidence: 99%
“…Сведения о реальной структуре тонкого слоя, которая зависит от элементного состава гетероструктуры, номинальной толщины слоя и технологии его роста, можно получить методами электронной микроскопии и оптической спектроскопии. Данные ряда работ [1][2][3][4][5][6][7][8][9] для гетероструктур типа II−VI, в частности, для системы CdTe/ZnTe с одной и той же номинальной толщиной узкозонного слоя, существенно различаются относительно энергетического положения и формы полосы излучения. Это свидетельствует о сильной зависимости реального строения тонкого слоя от технологических условий его формирования.…”
Section: Introductionunclassified