This paper describes a systematic method for the automatic generation of fabrication processes of thin lm devices. The method uses a partially ordered set poset representation of device topology describing the order between its various components in the form of a directed acyclic graph. The sequence in which these components are fabricated is determined from the poset linear extensions, and the component sequence is expanded into a corresponding process ow. The graphtheoretic synthesis method is powerful enough to establish existence and multiplicity o f o ws thus creating a design space D suitable for optimization. The cardinality kDk for a device with N components is large with a worst case kDk N , 1! yielding in general a combinatorial explosion of solutions. The number of solutions is controlled through a-priori estimates of kDk and condensation of the device graph. The method has been implemented in the computer program MISTIC Michigan Synthesis Tools for Integrated Circuits which calculates speci c process parameters using an internal database of process modules and materials. Currently MISTIC includes process modules for deposition, lithography, etching, ion implantation, coupled simultaneous di usions, and reactive growth. The compilation procedure was applied to several device structures. For a double metal twin-well BiCMOS structure, the compiler generated 168 complete process ows.