2001
DOI: 10.1016/s0026-2714(00)00253-5
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Soft breakdown and hard breakdown in ultra-thin oxides

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Cited by 30 publications
(13 citation statements)
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“…The geometric structure of the wire is still maintained in the breakdown state, and the process is reversible. In this sense, the breakdown for this SiO 2 nanowire can be classified as soft breakdown [22]. From Mulliken population analysis, it is found that the charges are redistributed in the field.…”
mentioning
confidence: 93%
“…The geometric structure of the wire is still maintained in the breakdown state, and the process is reversible. In this sense, the breakdown for this SiO 2 nanowire can be classified as soft breakdown [22]. From Mulliken population analysis, it is found that the charges are redistributed in the field.…”
mentioning
confidence: 93%
“…The drain voltage (V DS ) was then measured by applying a constant stress current to the drain electrode (I DS_inj ) with source grounded in the range of I off (<10 À10 A) level which was estimated from the transfer characteristics with V DS variation up to the saturation regime (V DS > V GS -V TH ). compliance voltage of V DS was set to $80 V to avoid I DS_inj induced hard breakdown (HBD) [11]. The electrical characteristics were measured at room temperature using Keithley 236 source measurement units (SMUs).…”
Section: Fabrication and Measurementsmentioning
confidence: 99%
“…The generated defects lead to intrinsic breakdowns and the built-in defects lead to extrinsic breakdowns. The traps generated by the high-voltage stress lead to an increase in the oxide noise, with this noise being statistically modeled [143,150,169,171,[760][761][762][763][764][765][766][767][768]. Trap-generated noise, with properties similar to trap-generated noise in oxides, has been found in silicon p-n junctions [769].…”
Section: Statistics Of Wearout and Breakdownmentioning
confidence: 99%