Soft x-ray production from laser produced plasmas for lithography applications

Spitzer, R.

doi:10.1116/1.586573

Cited by 46 publications

(14 citation statements)

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“…1 Transient laserproduced tin plasma is currently considered as a candidate for an EUV radiation source. Spitzer et al 2 studied Sn as an efficient target to convert Nd: YAG ͑yttrium aluminum garnet͒ radiation to 13.5-nm EUV radiation, achieving over 2% conversion efficiency. Laser-induced plasma ͑LIP͒ techniques are also used in space applications such as in chemical sensors for the exploration of Mars and micropropulsion for satellite positioning, as well as in the detection of biological molecules.…”

Section: Introductionmentioning

confidence: 99%

Spectroscopic characterization of laser-induced tin plasma

Harilal

O'Shay

Tillack

et al. 2005

Journal of Applied Physics

157

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Optical emission spectroscopic studies have been carried out on a tin plasma generated using 1064-nm, 8-ns pulses from a Nd:yttrium aluminum garnet laser. Temperature and density were estimated from the analysis of spectral data. The temperature measurements have been performed by Boltzmann diagram method using singly ionized Sn lines, while density measurements were made using the Stark broadening method. An initial temperature of 3.2 eV and density of 7.7×1017cm−3 were measured. Temporal and spatial behaviors of electron temperature and density in the laser-generated tin plasma have been analyzed. Time evolutions of density and temperature are found to decay adiabatically at early times. The spatial variation of density shows approximately 1∕z dependence. The time-integrated temperature exhibits an appreciable rise at distances greater than 7 mm. This may be caused by the deviation from local thermodynamic equilibrium at larger distances from the target surface.

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Section: Introductionmentioning

confidence: 99%

Spectroscopic characterization of laser-induced tin plasma

Harilal

O'Shay

Tillack

et al. 2005

Journal of Applied Physics

157

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“…However, the observed CE at 13 nm within 2.5% bandwidth for a tin plate was only 1%, and the difference between CE for a gold plate was small. 18 Hence, the simple change of a Xe plasma to a Sn plasma does not increase CE so much. Therefore, we have to examine how CE is determined.…”

Section: Spectral Efficiencymentioning

confidence: 96%

“…Furthermore, the practical conversion efficiency (CE) of a Sn plasma produced on a Sn plate was not so high compared with other elements like gold. 18 At the early stage of EUV source development, people discussed the plug efficiency only. The author emphasized the importance of reducing heat load in vacuum.…”

Section: Advocacy Of a Sn Plasmamentioning

confidence: 99%

Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Tomie

2012

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Today intermediate-focus equivalent extreme ultraviolet (EUV) power of several watts is now available, and EUV lithography scanners are being considered as potential scanners for high-volume manufacturing (HVM) tools. However, for high-volume manufacturing with throughput of over 100 wafers per hour, EUV power of 350 W may be required. We review the history of EUV sources for lithography with tin as fuel. We discuss the ideal plasma for tin sources for extreme ultraviolet lithography (EUVL), conditions for a high conversion efficiency of 4% to 5% in 2πsr, and the existence of a repetition rate limit at around 40 kHz. We review the present status reported by EUV source suppliers and the prospects of tin laserproduced plasma as an EUV source for HVM EUVL.

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“…Laser produced tin plasma has been identified as one of the most promising light sources for next generation extreme ultraviolet lithography [9,10]. For laserproduced tin plasmas, (1 ÷ 2.5) % soft X-ray CEs at power densities of (0.5 ÷ 5) × 10 11 W cm −2 within a 2 % bandwidth around 13.5 nm and into 2π sr have been obtained experimentally [7].…”

Section: Introductionmentioning

confidence: 97%

Simulation of Ni-like and Co-like X-rays emitted from laser produced tin plasmas

et al. 2006

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The Ni-like and Co-like X-rays emitted from laser produced Tin plasmas generated using the 1.06 µm, 1.2 ns pulses from a Nd:YAG laser were modelled. The modelling includes the Ni-like and Co-like X-ray resonance line spectrum emitted from Sn plasma between 12Å -25Å and also free-free and free-bound continuous spectrum emitted from the Zn-, Cu-, Ni-, Co-and Fe-like ions between 1Å and 30Å. Then, X-ray conversion efficiencies were calculated using these spectra. Maximum X-ray conversion efficiency was obtained 3.54 % at power density of 5 × 10 12 W cm −2 into 2π steradian. X-ray pulse durations were calculated spectrally integrated total X-ray emission of the Ni-like and Co-like from Sn plasmas.

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Soft x-ray production from laser produced plasmas for lithography applications

Cited by 46 publications

References 0 publications

Spectroscopic characterization of laser-induced tin plasma

Spectroscopic characterization of laser-induced tin plasma

Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Simulation of Ni-like and Co-like X-rays emitted from laser produced tin plasmas

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