2018
DOI: 10.1016/j.apsusc.2018.01.236
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Sol-gel-processed yttrium-doped NiO as hole transport layer in inverted perovskite solar cells for enhanced performance

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Cited by 114 publications
(63 citation statements)
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“…143 Yttrium-doped NiO films were processed by the sol-gel method in an inverted planar architecture to obtain a highly stable film with a V oc , J sc , FF, and a PCE of 1.00 V, 23.82 mA/cm 2 , 68%, and 16.31%, respectively. 144 The improved performance as a function of the HTM incorporated was attributed to the increased transport of holes, highly compact morphological area and reduced recombination of carriers. Lee et al doped nickel oxide with zinc and observed a good penetration of the zinc into the NiO; which further enhanced its electrical conductivity, the density of charge carriers and stability of the perovskite device.…”
Section: Doped Nickel Oxide As Htmmentioning
confidence: 99%
“…143 Yttrium-doped NiO films were processed by the sol-gel method in an inverted planar architecture to obtain a highly stable film with a V oc , J sc , FF, and a PCE of 1.00 V, 23.82 mA/cm 2 , 68%, and 16.31%, respectively. 144 The improved performance as a function of the HTM incorporated was attributed to the increased transport of holes, highly compact morphological area and reduced recombination of carriers. Lee et al doped nickel oxide with zinc and observed a good penetration of the zinc into the NiO; which further enhanced its electrical conductivity, the density of charge carriers and stability of the perovskite device.…”
Section: Doped Nickel Oxide As Htmmentioning
confidence: 99%
“…2013 年, Snaith 等 [59] 首次将 Kim 等 [10] 将掺铜 NiO x 作空穴传输层, 铜离子的掺 杂使得 NiO x 导电率提高, 从而促进了 NiO x /钙钛矿界面 电荷提取更为迅速, 同时降低了器件的串联电阻, 从而 使得 J sc 和 FF 提高, 器件光电转换效率为 15.40%. Zhao 等 [11] 采用溶胶-凝胶法制备 Y 3+ 掺杂的 NiO 作为空穴传 输层, 获得高空穴迁移率的 NiO 致密活性层, 改善了界 面电荷的复合和传输, 器件光电转化效率为 16.31%. Li 等 [12] 报道了基于 Ag + 掺杂的 NiO x (Ag:…”
Section: ) Pedot:pssunclassified
“…Nickel oxide (NiO) has a wide band gap (~3.6 eV), high transmittance in the visible range and an excellent chemical stability, it is thus widely used in electronic devices [1], solar cells [2,3], super-capacitors [4,5], gas sensors [6][7][8], catalysis [9,10] and so on. So far, most NiO thin films have been prepared by magnetron sputtering [11][12][13], chemical solution [14,15], thermal oxidation [16], and atomic-layer-deposition (ALD) [2,4,5].…”
Section: Introductionmentioning
confidence: 99%