“…24 A variety of wet and dry methods have been used for deposition of metal sulfide thin films. These methods include chemical bath deposition, 25 spin coating, 26 chemical spray pyrolysis, 27 successive ion layer adsorption and reaction (SILAR), 28 physical vapor deposition (PVD), 29 atomic layer deposition (ALD), 30 modulated flux deposition, 31 electrodeposition 32 and metal-organic chemical vapor deposition (MOCVD) 33 including aerosol assisted chemical vapor deposition (AACVD). 34 It has been found that the thin films deposited by different techniques have different phase structure and degree of crystallinity, thus showing variable electrical as well as optoelectronic properties.…”