“…The ability to modulate the compositional profile in germanium (Ge) and silicon (Si) superlattice structures has been the key to achieve artificially designed electronic, photonic, and phononic properties and functionalities. − The band profile engineering becomes more prominent in quasi one-dimensional (1D) Ge/Si superlattice nanowires (NWs), − where both a stronger lateral confinement and a periodic diameter variation can contribute to an enhanced band profile and transport modulation in the 1D channels. So far, periodic diameter modulations in Ge or Si NWs are usually accomplished by top-down electron beam lithography , and selective etching. , While compositional modulations in hetero Ge/Si NWs are mostly fabricated by vertical etching into a planar Ge/Si superlattice, , self-assembly growth led by nanometal droplets represents a straightforward, economic, and versatile bottom-up approach − to engineer the composition in Ge/Si NWs, − ,− where the precursor supplies are alternated periodically during a vapor–liquid–solid (VLS) − ,, or a solution–liquid–solid − growth process. In these precursor-alternating approaches, the chamber or solution environment has to be evacuated completely twice to complete a single period of Ge/Si segments to guarantee a thoroughly compositional transition and minimize the reservoir effects (for VLS growth, in the catalyst metal droplets). ,, This leads to a rather slow sequential multistep control to engineer the superlattice-like Ge/Si hetero NWs.…”