Spectrophotometric Determination of the Partition Constant for Five β-Diketones in Triton X-100 Micellar Systems

Inaba, Kazuho

doi:10.2116/analsci.17.349

Cited by 35 publications

(1 citation statement)

References 13 publications

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“…The latter solution corresponded to a concentration of 7.8 ϫ 10 −5 mol/cm 3 , which was greater than the critical micelle concentration of 2.4 ϫ 10 −7 mol/cm 3 for the nonionic detergent. 26 UDHF was chosen to represent the greatest concentration available in semiconductor grade ͑0.027 mol/cm 3 ͒, and the latter two solutions were expected to alter the corrosion process ͑while added H 2 O would halve the SiO 2 etch rate͒, based on their polar nature or improved wetting characteristics, respectively.…”

Section: Methodsmentioning

confidence: 99%

Relation Between Morphology, Etch Rate, Surface Wetting, and Electrochemical Characteristics for Micromachined Silicon Subject to Galvanic Corrosion

Miller

Becker

Stoldt

2008

J. Electrochem. Soc.

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Immersion of silicon in HF-based solutions is utilized in microsystems fabrication to render freestanding mechanical structures. Such etching, however, creates a galvanic couple between silicon and a metallic layer ͑e.g., gold͒, resulting in corrosion damage. Morphology, resistive probe, surface wetting, and electrochemical characterization ͑vs Cu/CuF͒ of single-and polycrystalline silicon subjected to galvanic corrosion in three HF-based solutions ͑undiluted 48% HF, UDHF:H 2 O, and UDHF:Triton X-100͒ are used here to formally substantiate the results of a previous mechanical ͑microtensile͒ study. Porosity estimated from the morphology of corroded samples allows the corrosion current density to be determined from etch-rate measurements, according to Faraday's law. Resistive probe structures are used to simulate the microtensile specimens, thereby characterizing corrosion current as a function of time, etchant type, illumination, and the amount of metal utilized. The measured current density of micromachined silicon is compared against ͑100͒ wafer specimens using polarization characterization, identifying the porous Si formation regime. Using sessile drop measurements, the three etchants are further distinguished based on their surface-wetting characteristics. The chronopotentiometry, resistive probe, and microtensile characterizations all identify the behavior regimes of rapid initiation, subsequent steady-state corrosion, and the final catastrophic failure of the microtensile specimens.

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Section: Methodsmentioning

confidence: 99%