“…[3,13] V. Yordsri National Metal and Materials Technology Center (MTEC) NSTDA 111 Thailand Science Park, Paholyothin Rd., Klong Nueng, Klong Luang, In this study, we fabricate ZrN thin film SERS substrate using reactive gas-timing (RGT) rf magnetron sputtering technique. [5,15,[20][21][22][23][24] The tailored properties of ZrN thin film exploited for SERS activity could be achieved by controlling an amount of sputtered atom from the target and enriching sputtered energy through a turn-on timing of Ar sequence variation. [5,15,20,22] We find that the spatially plasmonic hotspots on the surface of ZrN SERS substrate, resulting from the discrete conductive surface profile, strongly relate to non-stoichiometric composition and the degree of (200)-oriented texture at the surface of ZrN thin film.…”