1981
DOI: 10.1016/0040-6090(81)90363-1
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Sprayed films of indium tin oxide and fluorine-doped tin oxide of large surface area

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Cited by 116 publications
(31 citation statements)
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“…The details of the pyrosol method have been previously reported [7][8][9][10]. ITO films were prepared using a reactant solution of 0.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The details of the pyrosol method have been previously reported [7][8][9][10]. ITO films were prepared using a reactant solution of 0.…”
Section: Methodsmentioning
confidence: 99%
“…Various methods have been reported for preparing ITO, such as sputtering [4], chemical vapor deposition [5], electron beam deposition [6], and spray pyrolysis [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…The consequence of impurity/defect centers is the unacceptably large value of absorption observed in some sputtered and thermally evaporated layers 3 of ITO compared with those reported which have been fabricated by other techniques. 4,[8][9][10][11] A plot of two reported sets of data is shown in Fig. 2.…”
Section: Absorption By Defects and Impuritiesmentioning
confidence: 99%
“…Results from sputtered films (dc and magnetron) have already achieved this goal. 4,[8][9][10][11] Sputtering and vacuum evaporation are preferred techniques for film deposition because they are compatible with present semiconductor device technology.…”
Section: Absorption By Defects and Impuritiesmentioning
confidence: 99%
“…Spray CVD (mist CVD or spray pyrolysis) of ITO films is instrumentally cheap and needs substrate heating so that it should be focused to the deposition onto glass or silicon substrates. Table I show reports [1][2][3][4][5][6][7][8][9][10][11][12][13] on spray CVD of ITO films using indium chloride and tin chlorides which are stable and relatively cheap raw materials. Tin (IV) chloride SnCl 4 was used as the tin-doping source.…”
Section: Introductionmentioning
confidence: 99%