Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering

Zhao, Yang; Wang, Hui; Yang, Fan; Wang, Zhiyuan; Li, Jingjie; Gao, Yanning; Feng, Zhennan; Li, Xinzhong; Zhen, Ziyang

doi:10.1590/1980-5373-mr-2017-0836

Cited by 10 publications

(4 citation statements)

References 27 publications

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“…The value of Ra may be affected by the 100-W RF power condition, and the axis of the sputtering target of 45 o as thin film deposited with perpendicular axis generates smoother roughness (< 1 nm) [14]. Smooth roughness of the surface can be achieved by adjusting power lower than 100 W, as mentioned by other researchers [24]. In chemical synthesis growth mechanism, uniform and regular shape in the form of nanorod developed [13].…”

Section: Thin Film Characteristicsmentioning

confidence: 84%

Characterization and structural analysis of RF magnetron sputtered strontium stannate thin films

et al. 2021

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This paper presents physical and morphology properties of strontium stannate (SrSnO3) perovskite-type as a candidate of an n-type material thin film for organic-inorganic hybrid diode heterojunction for optoelectronics application. Typical wet-process of SrSnO3 deposition produce thick film and having 10 -8 S/cm order in conductivity. The SrSnO3 thin films were deposited on ITO glass substrates by RF magnetron sputtering using a purity 99.9% SrSnO3 target with 5.0 mTorr of gas pressure and 100 W of RF power at room temperature. The gas composition of pure argon (75%) and reactive oxygen gas (25%) was used for 60 min. XRD diffraction patterns revealed that the thin films are orthorhombic crystal structure with lattice parameter a=5.7040 Ǻ, b=8.06 Ǻ and c=5.7080 Ǻ with a strong orientation in the (002) direction. SEM images showed that films exhibited uniform surface morphology with a roughness average of Ra=2.258 nm and thickness of 311 nm. The EDX spectrum confirmed the presence of O, Sr, and Sn elements in the films with 75.22%, 8.29%, 16.49% in atomic number, respectively. The films were having a conductivity of 8.3310 2 S/cm with low resistivity of 12.410 -3 -cm.

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Section: Thin Film Characteristicsmentioning

confidence: 84%

Characterization and structural analysis of RF magnetron sputtered strontium stannate thin films

et al. 2021

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“…The higher RF power in the sputtering process induces the bombarding argon ions with higher kinetic energy, which increases the sputtering yield. [9,28] Increasing the RF power resulted in a higher deposition rate and altered the optical properties of the films as it has been reported in literatures [9,[34][35][36][37][38]. The optical transmission was influenced both by the roughness and thickness of the films.…”

Section: Optical Transmissionmentioning

confidence: 91%

“…The optical transmission was influenced both by the roughness and thickness of the films. Several groups demonstrated that the optical transmission of the films decreased with higher roughness and thickness [9,34,35,38] due to high energy of sputtering particles as the RF power increased [32,39].…”

Section: Optical Transmissionmentioning

confidence: 99%

Preparation of transparent alumina thin films deposited by RF magnetron sputtering

et al. 2021

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Alumina (Al2O3) thin films were prepared by RF magnetron sputtering technique using Al2O3 ceramic target. Effects of sputtering powers and oxygen gas mixtures were investigated and the optimized coating condition was applied on semi-precious gemstones. RF sputtering powers were varied to optimize the transparency of the films. Besides, the oxygen gas mixtures were also studied at the optimized sputtering power with a constant sputtering pressure. Optical and physical properties of the thin films were investigated using UV-Vis Spectrophotometer, FESEM, XRF, GIXRD, XRR including a microscratch tester. The Al2O3 films were highly transparent in the visible region in form of an amorphous phase with granular structure of the surface morphology. Thickness of the films decreased significantly with an introduction of the oxygen gas in the sputtering process but slowly decreased with further addition of the oxygen gas. Density of the film changed linearly with the variation of the oxygen gas mixtures. The semi-precious gemstones gained higher scratch resistance after the Al2O3 thin films coating. To enhance the scratch resistance and maintain the aesthetic appearance of the semi-precious gemstones, the most optimum deposition condition for the Al2O3 thin film coating was determined for the RF magnetron sputtering technique at room temperature.

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“…12 The metal chloride has different uses like industrial to product oxides and ferrites. 13 NiO samples have been fabricated using various kinds of techniques, including thermal evaporation, 14 plasma enhanced chemical vapor deposition, 15 sol-gel, 16 sputtering, 17 RF magnetron sputtering, 18 and spray pyrolysis. 19 In this work, the effect of Cu doping ratio with the NiO thin film characterized by means of focusing on structural, optical properties, and electrical has been studied.…”

Section: Introductionmentioning

confidence: 99%

The structural, optical, and morphological properties of NiO‐Cu prepared by spray pyrolysis technique

Mohamad

Abdul‐Husaain²,

Al‐Jarah

2020

Micro & Optical Tech Letters

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The technique of spray pyrolysis used to prepare the pure thin films NiO and NiO:Cu. In this study, the nickel chloride salt solution (NiCl2⋅6H2O) was used to fabricate thin films deposited on a glass substrate. The structural, optical, and morphological fabricated properties of the samples were investigated. X‐ray diffraction reveals a polycrystalline nickel oxide layer with a crystalline cubic form, with (111), (200), and (222). Atomic force microscopic studied the surface morphology of the thin‐film samples. The fabrication process of growth was at the specific doping ratio (0%, 0.5%, 1%, 1.5%, and 2%) where all thin films had a cubic structure. The energy difference for the NiO and NiO:Cu reference samples have ranged from 3.25 to 3.5 eV. The mobility, magnetoresistance, resistivity, and conductivity were measured and presented as well as the relationship between current‐voltage and current‐resistivity.

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Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering

Cited by 10 publications

References 27 publications

Characterization and structural analysis of RF magnetron sputtered strontium stannate thin films

Characterization and structural analysis of RF magnetron sputtered strontium stannate thin films

Preparation of transparent alumina thin films deposited by RF magnetron sputtering

The structural, optical, and morphological properties of NiO‐Cu prepared by spray pyrolysis technique

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