Stability and performance analysis of mixed product run-to-run control

Zheng, Ying; Lin, Qwan-Han; Wang, David Shan-Hill; Jang, Shi-Shang; Hui, Keung

doi:10.1016/j.jprocont.2005.09.005

Cited by 46 publications

(20 citation statements)

References 12 publications

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“…One solution to the mixed product problem include the employment of a disturbance model for for each product type , with the appropriate used in the deadbeat control calculation in [108], [109]. EWMA controllers can also be used across different tools, via the use of multiple process models [108], by employing different and parameters for each tool. Zheng et al [108] also consider the stability and performance implications of using multiple process and disturbance models.…”

Section: ) Algorithmsmentioning

confidence: 99%

See 1 more Smart Citation

Estimation and Control in Semiconductor Etch: Practice and Possibilities

Ringwood

Lynn

Bacelli

et al. 2010

IEEE Trans. Semicond. Manufact.

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Abstract-Semiconductor wafer etching is, to a large extent, an open-loop process with little direct feedback control. Most silicon chip manufacturers rely on the rigorous adherence to a "recipe" for the various etch processes, which have been built up based on considerable historical experience. However, residue buildup and difficulties in achieving consistent preventative maintenance operations lead to drifts and step changes in process characteristics. This paper examines the particular technical difficulties encountered in achieving consistency in the etching of semiconductor wafers and documents the range of estimation and control techniques currently available to address these difficulties. An important feature of such an assessment is the range of measurement options available if closed-loop control is to be achieved.Index Terms-Closed-loop control, plasma etch, run-to-run control, semiconductor wafer, state estimation, virtual metrology.

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Section: ) Algorithmsmentioning

confidence: 99%

“…EWMA controllers can also be used across different tools, via the use of multiple process models [108], by employing different and parameters for each tool. Zheng et al [108] also consider the stability and performance implications of using multiple process and disturbance models.…”

Section: ) Algorithmsmentioning

confidence: 99%

Estimation and Control in Semiconductor Etch: Practice and Possibilities

Ringwood

Lynn

Bacelli

et al. 2010

IEEE Trans. Semicond. Manufact.

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“…Prabhu and Edgar [10] introduced a state estimation method based on a random walk which combined with a moving window approach and least squares solution to solve the "high-mix" problem. Zheng [11] demonstrated that product-based exponentially weighted moving average (EWMA) control was more suitable for the mixed run process than tool-based EWMA control. However, all these methods are restricted by one or more factors as below: product's model must be acquired through testing wafers in advance, model's input-output gain is assumed to be constant, production schedule that consists of products' order and batch number for every kind of product is set artificially beforehand.…”

Section: Introductionmentioning

confidence: 99%

Adaptive EWMA controller based on dynamic modeling in semiconductor manufacturing

Liang

Wang

2014

The 26th Chinese Control and Decision Conference (2014 CCDC)

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In semiconductor manufacturing, it is important to produce multiple products on the same equipment to enhance the overall equipment effectiveness so as to improve the productivity. However, the "high-mix" production is difficult to control due to the time-varying model. To address this problem, an adaptive exponentially weighted moving average (EWMA) control method of which the core content is online dynamic modeling is put forward. During dynamic modeling process, the noise disturbance can be predicted through EWMA controller; meanwhile, the process gain can be estimated by using the predicted noise disturbance. Case studies of the chemical mechanical polishing (CMP) unit operation show the efficacy and the attractiveness of the strategy.

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“…However, those papers did not consider the processes in mixed product situation. Only a few studies have addressed the RtR control of a mixed product process plant, such as: Just-in-time Adaptive Disturbance Estimation (JADE) [13], tool-based and product-based EWMA control [14], threaded PCC [15] and CF-EWMA [16] controller.…”

Section: Introductionmentioning

confidence: 99%

un-to-Run Mixed Product Overlay Process Control: Using Tool Based Disturbance Estimator (TBDE) Approach

Lee¹,

Kuo²,

Chiang³

2013

IJET

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Abstract-Advanced process control (APC) has been recognized as a proper tool for maximizing profitability of semiconductor manufacturing facilities by improving efficiency and product quality. Run-to-run (RtR) process control with good quality and reliable performance for APC applications are most applicable. This paper proposes a new RtR control scheme, tool based disturbance estimator (TBDE) control scheme, which is adaptive to the mixed product overlay processes. The TBDE control scheme which employs threaded double exponential weighted moving average (d-EWMA) with the drift compensation scheme to deal with the disturbance caused by tool-induced drift and product-induced shift. The method is applied to the estimation of overlay parameters in mixed product lithography overlay process. The experimental results revealed that application of the TBDE is proven to significantly improvement in the mixed product overlay process.Index Terms-Advanced process control, run-to-run, overlay, mixed product, TBDE control scheme.

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Stability and performance analysis of mixed product run-to-run control

Cited by 46 publications

References 12 publications

Estimation and Control in Semiconductor Etch: Practice and Possibilities

Estimation and Control in Semiconductor Etch: Practice and Possibilities

Adaptive EWMA controller based on dynamic modeling in semiconductor manufacturing

un-to-Run Mixed Product Overlay Process Control: Using Tool Based Disturbance Estimator (TBDE) Approach

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