A new failure mechanism of AlGaAs/InGaAs pseudomorphic high electron mobility transistors has
been observed after hot carrier dc accelerated testing. Hot carrier effects have been characterized by
means of gate current measurements and electroluminescence spectroscopy. After accelerated
testing, a permanent degradation has been found, consisting of the decrease of drain current ID, and
of the absolute value of the pinch-off voltage Vp , at low drain-source voltage VDS , resulting in the
development of a remarkable ‘‘kink’’ in the output characteristics. Direct current, pulsed, and
low-frequency ac measurements demonstrate that the failure mechanism consists of the creation of
deep levels under the gate which act as electron traps at low gate-to-drain electric fields. Deep level
transient spectroscopy and photoinjection measurements reveal the presence of two levels at 0.77 eV
and 1.22 eV. The intensity of the 1.22 eV peak is correlated with the degradation observed in
stressed devices