“…In the area of nanoscale device research, various scanning probe microscopy (SPM) methods have been a workhorse for a device analysis because they provide nanoscale mapping of the electronic properties of the components in a nanodevice and thus enable versatile analyses of the device characteristics using only a single device. − For example, conducting atomic force microscopy (CAFM) is a powerful technique to measure electric currents for characterizing conductivity variations in nanoscale channels. − With Kelvin probe force microscopy, the work function variation on the surfaces of nanodevices can be observed. On the other hand, as the dimension and the operating voltage of modern electronic devices are reduced, its low-frequency noise is becoming a critical parameter determining the device performance. − Especially, 1/ f noise can be a significant problem in the devices based on nanomaterials such as graphene, − carbon nanotubes, − and nanowires. , In previous works, noise characteristics of various devices have been analyzed through the scaling behavior obtained from the noise measurement of multiple devices with different resistance values. − However, the fabrication of multiple devices for such noise analysis can be a labor-intensive work. Until now, SPM strategies have not been applied for nanodevice noise analysis.…”