Step and flash imprint lithography: Defect analysis

Abstract

Step and flash imprint lithography ͑SFIL͒ is a promising, low cost alternative to projection printing. This technique has demonstrated very high resolution and overlay alignment capabilities, but it is a contact printing technique so there is concern about defect generation and propagation. A series of experiments has been carried out with the goal of quantifying the effect of defect propagation. To that end, each unit process in SFIL was studied independently. The number of particles added during handling and transportation and due to SFIL machinery was deemed acceptable, and the added particles should not complicate the inspection of process defects. The concept of a ''self-cleaning'' process in which the imprint template becomes cleaner by imprinting was revisited. Inspection of an imprint template before and after imprinting revealed that the template actually becomes cleaner with imprinting. Visual inspection of multiple imprints did not reveal any systematic generation or propagation of defects.

Free-space nano-optical devices and integration: Design, fabrication, and manufacturing

“…The imprint lithography is based on wafer-surface nanopatterning using a mold, which is similar in concept to all the mold-based nanoreplication technologies previously reported, such as nano-embossing lithography [10,23], nanoimprint lithography [7,8,17,31], UV-nano-imprint lithography [15], and step-and-flash imprint lithography [2,3,9]. Nano-embossing lithography [10,23] was used to emboss the nanostructure pattern from a hard mold into a soft layer material (e.g., thermoplastics) and then to transfer the pattern into the substrate layers.…”

Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling

“…They can, however, be easily replicated from a master template. Particles will not be a major issue because NIS, like S-FIL [2], is a 54 self-cleaning process. The excessive ink left on the mold after each stamping can be cleaned with an appropriate solvent.…”

“…where exposure dose x (step size) 2 (344) charge of electron Again, most parameters in (3.43) are determined by either the SEBL tool, or by the lithography process. For example, the collection efficiency is limited by the SE detector, and with an appropriate design, it can reach its theoretical limit of 1 [41].…”

Low‐Cost Fabrication of Transparent Hard Replica Molds for Imprinting Lithography

“…[9] For these reasons, step and flash imprint lithography (S-FIL) was developed by Willson's group. [10] Because S-FIL uses a UV-curing oligomer with a low viscosity as the patterning material during the imprinting process and a transparent hard mold, the technique can be employed successfully at room temperature and at low pressure. [11,12] This method has demonstrated potential for fine-structure fabrication in various fields, such as electronic devices, [13][14][15][16] biological applications, [17] and alignment layers for advanced liquid-crystal displays.…”