To improve accuracy of defect densities, yield prediction and failure analysis, this paper compares data on defects and faults collected by electrical measurement methods and laser scattering systems. For that we choose the checkerboard test structure design to partition the whole chip area into a large number of subchips, each containing defect sensitive comb lines. A digital tester based measurement procedure enables the detection and separation of faults. Additional analysis procedures guarantee a layer-specific fault localization inside specific subchips. Manufacturing of test chips at Thesys Gesellschaft für Mikroelektronik was accompanied by laser scattering after selected processed layers. Finally, wafermaps based on electrically detected faults and optically detected particle defects were analyzed to determine correlations between defects and faults.