Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

“…The surface layer has the highest content of nitrogen, but the N content decreases to near zero gradually with the sputtering time (i.e., film depth). The nitrogenated ta-C film has good mixing degree of chemical elements and no abrupt change in the interface region, which is believed to have anticipated high scratch resistance and adhesion strength [20].…”

60 years of DLC coatings: Historical highlights and technical review of cathodic arc processes to synthesize various DLC types, and their evolution for industrial applications

“…1500 V [247] or 3000 V [248], and lowering the bias stepwise or continuously to deposit more sp 3 -rich coating zones. A stress reduction from 9 GPa for a ta-C monolayer to only 1.5 GPa for the gradient layer was reported [248].…”

Mechanical characterization of segment-structured hydrogen-free a-C films fabricated by filtered cathodic vacuum arc method

“…To date, the stress in hydrogen-free a-C and ta-C films has generally been reduced by several methods such as doping [17], the deposition of multilayer structures comprising soft and hard films [5,18] and thermal annealing [19]. Although these methods were efficient in reducing the internal stress, the resulting graphitization can decrease the hardness and wear resistance of the films [17,19].…”