Stress reduction of Mo/Si multilayer structures

Andreev, S. S.; Салащенко, Н. Н.; Suslov, L. A.; Yablonsky, A. N.; Zuev, S. Yu.

doi:10.1016/s0168-9002(01)01018-x

Cited by 18 publications

(8 citation statements)

References 7 publications

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“…However, by deposition of a Mo/Si multilayer structure on substrate, the former may develop mechanical stresses which can largely deform the original mirror. Therefore, one way of perfecting multilayer optics for EUV-lithography is to study mechanical stresses in multilayer Mo/Si-structures and develop methods for stresses compensation while maintaining maximum re°ectivity of Mo/Si-mirrors [27,28].…”

Section: Mirrors For Euv-lithographymentioning

confidence: 99%

Multilayer optics for XUV spectral region: technology fabrication and applications

et al. 2003

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We present research investigations in the eld of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scienti c instrumentation. We discuss normal incidence multilayer optics in the spectral region of \water window", multilayer optics for collimation and focusing of hard X-rays, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography ( ¶ = 13nm) and short period multilayer optics.

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Section: Mirrors For Euv-lithographymentioning

confidence: 99%

Multilayer optics for XUV spectral region: technology fabrication and applications

et al. 2003

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“…In order to preserve the quality of the shape of the surfaces and, as a consequence, the spatial resolution of the device, the technology of compensation of internal stresses in films was applied. The technique of compensation of internal stresses in structures based on a pair of Mo and Si materials is described in detail in [14]. The reflective characteristics of the lens mirrors obtained on the [15] reflectometer are shown in Fig.…”

Section: X-ray Optical Elementsmentioning

confidence: 99%

Imaging system of a plasma torch of a Betatron X-ray source

et al. 2022

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The paper describes the design of a microscope for studying a betatron radiation source based on the PEARL femtosecond laser complex in the SXR and EUV wavelength range. The main optical element of the microscope is a spherical Schwarzschild objective a x5 magnification. The device allows to study the size and spatial structure of the interaction area of laser radiation with matter, at a selected wavelength in the EUV or SXR range with a resolution of delta x=2.75 μm. The operation wavelength (λ=13.5 nm) is set by multilayer X-ray mirrors. Thin-film absorption filters are used to suppress the background component of the signal. Keywords: SXR and EUV radiation, betatron radiation, imaging x-ray optics, SXR microscope.

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“…For the amorphous multilayer with W = 0.30, the interface stress can be dominant, while the thicker Si layer grown on W seems to contribute to the larger compressive stress as compared to the sample with 22 and Mo/Si multilayer systems. 6 At a large thickness ratio of W = 0.67, the obvious polycrystallization of the W layers in the -and the -phases may increase the compressive stress, which gradually exceeds the interface effects, resulting in a relatively large stress state.…”

Section: W/si Multilayers With Different Thickness Ratiosmentioning

confidence: 99%

“…For instance, the stress of Mo/Si multilayers depended on the thickness ratio, and the stress value approached zero when Mo (ratio of the thickness of Mo to the multilayer period) = 0.6. 6 In the case of Mo/B 4 C multilayers, the interface roughness increased with an increase in the number of the bilayer period. 7 Similar studies have also been carried out using W/Si multilayers.…”

Section: Introductionmentioning

confidence: 96%

Stress and Microstructure Study of W/Si X-ray Multilayers with Different Structural Parameters

Huang

Yang

et al. 2019

j nanosci nanotechnol

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X-ray Timing and Polarimetry (XTP) telescope is proposed by using nested focusing optics with a large effective area for studies in the field of high energy physics (energy region of 1-30 keV). Highreflectance and low-stress W/Si multilayers are required for this telescope to improve the spectral response and maintain the figure quality of the mirrors simultaneously. In this paper, we focused on the study of stress and layer structure of W/Si periodic multilayers at different d-spacings (thickness of period), thickness ratios, and bilayer numbers. The results show that the stress of the multilayer increased from −73.3 to −465.5 MPa with increase in the d-spacing from 2.7 to 5.5 nm, while the change in the average interface width was negligible, from 0.31 to 0.36 nm. For the multilayers prepared with different thickness ratios of W, from 0.3 to 0.67 (d = 3.7 nm), the lowest stress appeared at the ratio of ∼0.46, and the average interface width was unchanged. The number of bilayers (N = 80-160) had negligible effects on both the layer structure and the stress, and the multilayers exhibited a very smooth surface morphology with a root-mean-square roughness of 0.19 nm. To further study the microstructural changes of the multilayer, X-ray diffraction measurements of the samples with different d-spacings and thickness ratios were performed. An increased crystallization along with phase changes were observed in the samples prepared with thicker W layers, which can increase the compressive stress of the multilayer.

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Stress reduction of Mo/Si multilayer structures

Cited by 18 publications

References 7 publications

Multilayer optics for XUV spectral region: technology fabrication and applications

Multilayer optics for XUV spectral region: technology fabrication and applications

Imaging system of a plasma torch of a Betatron X-ray source

Stress and Microstructure Study of W/Si X-ray Multilayers with Different Structural Parameters

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