1992
DOI: 10.1016/0921-5107(92)90064-g
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Structural and morphological studies of electrodeposited amorphous silicon thin films

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Cited by 7 publications
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“…Anodic oxidation in saturated H 2 SiF 6 is also an alternative to LPD in such solar cells. 16 Another possible application is in amorphous silicon thin-film deposition by an electrodeposition method 17 that results in high-resistivity Si films. Hydrofluorosilicic acid also has industrial applications such as caps etchant and phosphoric acid purification.…”
mentioning
confidence: 99%
“…Anodic oxidation in saturated H 2 SiF 6 is also an alternative to LPD in such solar cells. 16 Another possible application is in amorphous silicon thin-film deposition by an electrodeposition method 17 that results in high-resistivity Si films. Hydrofluorosilicic acid also has industrial applications such as caps etchant and phosphoric acid purification.…”
mentioning
confidence: 99%