Structural and optical properties of Cu-doped CdTe films with hexagonal phase grown by pulsed laser deposition

Abstract

Influence of plasma parameters and substrate temperature on the structural and optical properties of CdTe thin films deposited on glass by laser ablation

Role of Cu‐doping in CdTe thin films: Experiments and simulations

“…It is observed that the reflectance decreases with increasing annealing temperature, which is the evidence of diffusion of Cu in CdTe films. 9 The reason behind this low surface reflectance of annealed samples can be attributed to the evolved microstructure due to post-growth annealing and change in their refractive index due to Cu-doping in CdTe. The absorbance was calculated from the reflectance data using the Kubelka-…”

“…It turns out that the as-grown CdTe film has a band gap of 1.66 eV, which decreases to 1.58 and 1.47 eV after annealing at 473 and 673 K for 1 h in vacuum, respectively. 9 This can be explained by a higher degree of crystallinity and an increase in the crystallize size of S3. 18,44 These optical band gap values are summarized in…”

“…It is interesting to note that to grow CdTe films, several physical and chemical vapour deposition techniques are used such as sputtering, thermal evaporation, pulsed laser deposition, close-spaced sublimation and vapour transport deposition. 9,13,14,17,18 Among these techniques, sputtering offers some advantage, namely, growth of CdTe at relatively low substrate temperatures, over large areas with accurate composition and uniform morphology. 19 In this work, we investigate Cu-doping in CdTe films at elevated temperatures and related changes in their morphological, microstructural, structural, optical and electrical properties.…”

Stoichiometric 6H-SiC thin films deposited at low substrate temperature by laser ablation

“…18,19 The substrates were first degreased; for this process, they were immersed in an ultrasonic bath in xylene (tecsiquim > 98.5%), acetone (tecsiquim > 99.5%), and ethanol (tecsiquim > 95%) during 5 min for each solvent. 18,19 The substrates were first degreased; for this process, they were immersed in an ultrasonic bath in xylene (tecsiquim > 98.5%), acetone (tecsiquim > 99.5%), and ethanol (tecsiquim > 95%) during 5 min for each solvent.…”

“…A modification of the traditional laser ablation method has been developed by using powders enclosed in an ampoule as target material, 18 and the details of the deposition system are described elsewhere. 19 The use of powders as target allows preparing different compounds in the whole range of compositions increasing the number of materials that can be deposited by the laser ablation technique, besides it is not necessary to rotate the target as in the traditional technique.…”