2006
DOI: 10.1016/j.apsusc.2005.07.151
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Structural characterization and magnetoresistance of manganates thin films and Fe-doped manganates thin films

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Cited by 12 publications
(15 citation statements)
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“…Liu et al [24] studied the effect of Fe doping (0 ≤ y ≤ 0.10) in Mn site for the colossal magnetoresistance material La 5/6 Na 1/6 MnO 3 . Canulescu et al [25] observed that the CMR effect depended strongly on the substrate and the oxygen content influenced the transition temperature in La 0.6 Ca 0.4 MnO 3 doped with 20% Fe. Recently, there are a few reports about the Cr or Cu double-doped manganites in La 1−x Sr x MnO 3 system [26,27].…”
Section: Introductionmentioning
confidence: 98%
“…Liu et al [24] studied the effect of Fe doping (0 ≤ y ≤ 0.10) in Mn site for the colossal magnetoresistance material La 5/6 Na 1/6 MnO 3 . Canulescu et al [25] observed that the CMR effect depended strongly on the substrate and the oxygen content influenced the transition temperature in La 0.6 Ca 0.4 MnO 3 doped with 20% Fe. Recently, there are a few reports about the Cr or Cu double-doped manganites in La 1−x Sr x MnO 3 system [26,27].…”
Section: Introductionmentioning
confidence: 98%
“…SrTiO 3 ). Previous investigations have shown, that cobaltate and manganate perovskite-type films, prepared by PRCLA using two oxygen sources (N 2 O for the gas pulse and O 2 as the background), can exhibit relatively high oxygen deficiencies of up to δ = 0.6 [26,29]. Most of the films, studied in this work, were deposited using N 2 for the gas pulse and as background gas, i.e.…”
Section: 3mentioning
confidence: 99%
“…Thus, deposition of oxide films by PLD requires an additional source(s) of O to achieve deposition of films without oxygen deficiencies. The most commonly used sources of O are the background gas [20,34], a gas pulse (PRCLA) [26,29], and a RF-induced plasma plume (RFplasma assisted PLD) [35]. In our experiments the growing strontium titanate films are expected to contain anionic vacancies as no additional sources of O are used [33].…”
Section: General Aspects Of Film Depositionmentioning
confidence: 99%
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