“…12 For most of these applications, thin films of WO 3 with nanometre thickness are usually deposited onto glass or polymeric substrates. A variety of conventional deposition methods have been used to prepare WO 3 films, such as dc or radio frequency (rf) magnetron sputtering, 4,5,[13][14][15][16][17][18][19] sol-gel methods, 6,20,21 plasma spraying method, 7 chemical vapour deposition methods, 11,22,23 electron beam evaporation, 24,25 thermal evaporation 12,14 and hydrothermal methods. 2 Sputter deposition technique is popular to produce adherent and uniform film over wide areas with better stoichiometric control.…”