Structure and Characterization of Sputtered Thin Films Based on Lead Titanate.

Pignolet, A.; Schmid, P. E.; Wang, L.; Lévy, F.

doi:10.1557/proc-230-291

Cited by 4 publications

(7 citation statements)

References 27 publications

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“…In between lies the morphotropic phase boundary (MPB), confirming that the composition determines the crystalline structure of the ferroelectric phase. In agreement with observations on films deposited at high substrate temperature [14], the presence of PbO in the target powder has little influence on the film structure except that films sputtered from PbO-enriched targets show smaller concentrations of undesirable phases such as pyrochlore. Investigations of Okuyama et al [49] on PbTiO 3 films deposited on Pt sheet demonstrate that at substrate temperatures of 300 • C < Ts < 450 • C, films have mixed structures of pyrochlore and perovskite types, but those deposited above about 450 • C have the perovskite type (see Table 2 for other processing conditions).…”

Section: Srf2supporting

confidence: 88%

“…Numerous researchers have reported on the preparation [ 12 ] and suitability of PT as a pyroelectric sensor [ 13 , 14 ]. Modified PT materials have shown interesting piezoelectric [ 15 ] and pyro-electric properties.…”

Section: Methodsmentioning

confidence: 99%

“…Subs = Pt/Ti/Glass, Target was Pb (Zr, Ti) O 3 ceramic disk (dia = 100 mm), 100% pre-sputtering duration = 15 min [7] It used HVAC, base pressure = 10 −6 Torr; substrate: cleaved MgO (100) annealed at 1200 • C for 12 h, in air. [14] (100) Pt electrodes (0.2 µm thickness) deposited on the (100) cleaved and polished. MgO single crystals, or on the (100) cleaved and polished MgO substrates.…”

Section: Notes Referencementioning

confidence: 99%

“…The processing temperature in such cases is the crystallization temperature, Tcrys. This technique, referred to as solid-state crystallization (epitaxy), leads to the improvement of the dielectric properties of such films [ 14 , 50 , 60 , 61 , 62 ]. Magnetron sputtering conditions commonly utilized in the preparation of PT family films prepared by solid-state crystallization are summarized in Table 2 .…”

Section: Epitaxial Growth Of Lead Titanates By Magnetron Sputteringmentioning

confidence: 99%

“…Pignolet et al [ 14 ] studied the structure and characteristics of the RF-magnetron sputtered pure and doped PT as well as the PZT thin films deposited on platinum-coated silicon by RF-magnetron sputtering from a pressed powder target. Depending on the composition, poly films with either a tetragonal or rhombohedral structure were obtained using only a post-deposition thermal treatment (in the absence of any in situ heat treatment) see Table 2 .…”

Section: Epitaxial Growth Of Lead Titanates By Magnetron Sputteringmentioning

confidence: 99%

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Magnetron Sputtered Lead Titanates Thin Films for Pyroelectric Applications: Part 1: Epitaxial Growth, Material Characterization

Fathipour,

Xu,

Rana

2023

Materials

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Pyroelectric materials, are those materials with the property that in the absence of any externally applied electric field, develop a built-in spontaneous polarization in their unit cell structure. They are regarded as ideal detector elements for infrared applications because they can provide fast response time and uniform sensitivity at room temperature over all wavelengths. Crystals of the perovskite Lead Titanate (PbTiO3) family show pyroelectric characteristics and undergo structural phase transitions. They have a high Curie temperature (the temperature at which the material changes from the ferroelectric (polar) to the paraelectric (nonpolar) phase), high pyroelectric coefficient, high spontaneous polarization, low dielectric constant, and constitute important component materials not only useful for infrared detection, but also with vast applications in electronic, optic, and Micro-electromechanical systems (MEMS) devices. However, the preparation of large perfect, and pure single crystals of PbTiO3 is challenging. Additionally, difficulties arise in the application of such bulk crystals in terms of connection to processing circuits, large size, and high voltages required for their operation. A number of thin film fabrication techniques have been proposed to overcome these inadequacies, among which, magnetron sputtering has demonstrated many potentials. By addressing these aspects, the review article aims to contribute to the understanding of the challenges in the field of pyroelectric materials, highlight potential solutions, and showcase the advancements and potentials of pyroelectric perovskite series including PbZrTiO3 (PZT), PbxCa1−x (PZN-PT), etc. for which PbTiO3 is the end member. The review is presented in two parts. Part 1 focuses on material aspects, including preparation methods using magnetron sputtering and material characterization. We take a tutorial approach to discuss the progress made in epitaxial growth of lead titanate-based ceramics prepared by magnetron sputtering and examine how processing conditions may affect the crystalline quality of the growing film by linking to the properties of the substrate/buffer layer, growth substrate temperature, and the oxygen partial pressure in the gas mixture. Careful control and optimization of these parameters are crucial for achieving high-quality thin films with desired structural and morphological characteristics.

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Section: Srf2supporting

confidence: 88%

Section: Methodsmentioning

confidence: 99%

Section: Notes Referencementioning

confidence: 99%

Section: Epitaxial Growth Of Lead Titanates By Magnetron Sputteringmentioning

confidence: 99%

Section: Epitaxial Growth Of Lead Titanates By Magnetron Sputteringmentioning

confidence: 99%

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Magnetron Sputtered Lead Titanates Thin Films for Pyroelectric Applications: Part 1: Epitaxial Growth, Material Characterization

Fathipour,

Xu,

Rana

2023

Materials

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Optical properties of PbZrxTi1−xO3 on platinized silicon by infrared spectroscopic ellipsometry

Huang

Meng

Yang

et al. 2000

Applied Physics Letters

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A method of analyzing infrared spectroscopic ellipsometry (IRSE) measurement data is proposed for lead zirconate titanate PbZrxTi1−xO3 (PZT) thin films grown on Pt/Ti/SiO2/Si substrates with x=0.3 and 0.5. The IRSE data measured at an angle of incidence 75° for x=0.3 and 70° for x=0.5 are fitted by a dielectric function formula. The refractive index and extinction coefficient of PZT with x=0.3 and 0.5 are determined in the spectral range of 2.5–12.5 μm. As the wavelength increases, the refractive index decreases, on the contrary, the extinction coefficient increases. The absorption coefficient for x=0.5 is greater than that for x=0.3 by a factor of 1.5. The effective static ionic charges have also been derived, which are smaller than they would be in a purely ionic material for PZT thin films.

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Raman scattering from PbTiO3 thin films prepared on silicon substrates by radio frequency sputtering and thermal treatment

Taguchi

Pignolet

Wang

et al. 1993

Journal of Applied Physics

106

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Articles you may be interested inCrystallization of Pb(Zr,Ti)O3 films prepared by radio frequency magnetron sputtering with a stoichiometric oxide target J. Vac. Sci. Technol. A 13, 2214 (1995); 10.1116/1.579545 Effects of surface structures of MgO(100) single crystal substrates on ferroelectric PbTiO3 thin films grown by radio frequency sputtering J. Vac. Sci. Technol. A 13, 95 (1995); 10.1116/1.579392Raman scattering study of lead zirconate titanate thin films prepared on silicon substrates by radio frequency magnetron sputtering

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Structure and Characterization of Sputtered Thin Films Based on Lead Titanate.

Cited by 4 publications

References 27 publications

Magnetron Sputtered Lead Titanates Thin Films for Pyroelectric Applications: Part 1: Epitaxial Growth, Material Characterization

Magnetron Sputtered Lead Titanates Thin Films for Pyroelectric Applications: Part 1: Epitaxial Growth, Material Characterization

Optical properties of PbZrxTi1−xO3 on platinized silicon by infrared spectroscopic ellipsometry

Raman scattering from PbTiO3 thin films prepared on silicon substrates by radio frequency sputtering and thermal treatment

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