Structure and properties of Cr–B, Cr–B–N and multilayer Cr–B/Cr–B–N thin films prepared by r.f.-sputtering

Sakamaoto, Y.; Nosé, M.; Mae, Takehiko; Honbo, Eiji; Mei, Zhou; Nogi, Kiyoshi

doi:10.1016/s0257-8972(03)00697-2

Cited by 41 publications

(8 citation statements)

References 18 publications

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“…h-BN on the other hand is a common solid-lubricant due to its easily activated hexagonal shear systems with possible application temperatures up to 770°C [2]. Consequently, TM-B-N type coatings are thoroughly investigated, like Zr-B-N [3,4], Ti-B-N [5][6][7][8][9][10][11] and Cr-B-N [12][13][14][15][16][17][18]. Although there is conclusive evidence that h-BN can be formed in TM-B-N thin coatings [19], their reported lack of self-lubricating properties remains largely unexplained.…”

Section: Introductionmentioning

confidence: 99%

Effect of nitrogen-incorporation on structure, properties and performance of magnetron sputtered CrB2

Budna¹,

Mayrhofer²,

Neidhardt³

et al. 2008

Surface and Coatings Technology

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Section: Introductionmentioning

confidence: 99%

Effect of nitrogen-incorporation on structure, properties and performance of magnetron sputtered CrB2

Budna¹,

Mayrhofer²,

Neidhardt³

et al. 2008

Surface and Coatings Technology

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“…The volume fraction of BN phase increased with nitrogen concentration. Other phases, such as CrB, Cr 2 B, CrN and Cr 2 N [6,7] were not detected in the Cr2p, B1s and N1s spectra of Cr-B-N coatings Nos. 2-4.…”

mentioning

confidence: 82%

Structure and Properties of Hard Nanostructured Coatings in Cr-B-N System

Kiryukhantsev-Korneev

Pierson²,

Bauer³

et al. 2007

3rd France-Russia Seminar

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The CrB 2 thin coatings are of interest because of their high hardness, wear-and corrosion resistance [1,2]. Incorporation of nitrogen in transition metal-boron systems (TiB 2 , ZrB 2 etc.) often leads to enhancing of chemical, mechanical and tribological characteristics [3,4]. The objective of the present study is the investigation of structure and properties of Cr-B-N coatings.The CrB 2 targets were synthesized from exothermal powder mixtures by means of selfpropagating high-temperature synthesis [5]. The Cr-B-N coatings were obtained using DC magnetron sputtering of CrB 2 target in an argon atmosphere or in a gaseous mixtures Ar+N 2 (Table 1). The total pressure was maintained at 0.2 Pa. The diameter of the targets was 12.5 cm and the distance from the target to substrate was 9 cm. During deposition, the applied bias voltage was kept constant at -250 V and the substrate temperature was controlled at 250-300 0 C. Coatings were deposited on single crystal Si (100), Ni foil, and cemented carbide substrates for various times to obtain 1.0-2.5 m thick coatings.The structure, phase, and chemical composition of coatings were studied by means of transmission and scanning electron microscopy (TEM and SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron probe microanalysis (EPMA). To evaluate the oxidation resistance and thermal stability, the samples were annealed at 500, 700 and 900 0 C in air for 1 hour. The elemental depth profiles for oxidized coatings were obtained by second ion massspectrometry (SIMS). Adhesion (critical load Lc 2 ), hardness (H), Young's modulus (E) friction coefficient (f) and wear rate (Vw) were evaluated by means of scratch-tester, nanohardness tester, and pin-on-disk tribometer (CSM Instruments). The electrochemical tests of the Cr-B-N coatings were carried out in 5N H 2 SO 4 using three-electrode cell and VoltaLab 50 potentiostat (Radiometr analytical).

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“…This is different from the situation for the films deposited at 500 °C. The XPS spectrum of the B 1s region ( Figure 5a) shows four signals, two attributed to atomic boron (186.8 eV) and CrB2 (187.9 eV) [29,42,43], and the other two to a non-stoichiometric boron oxide BxOy (189.3 eV) and to B2O3 (192.3 eV).…”

Section: Films Characterizationmentioning

confidence: 99%

Femtosecond Pulsed Laser Deposition of Chromium Diboride-Rich Thin Films

et al. 2019

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Chromium borides are promising candidates for several structural applications including protective coatings for materials exposed to corrosive and abrasive environments. In this paper the pulsed laser deposition of chromium diboride-rich thin films has been carried out in vacuum by using a frequency doubled Nd:glass laser with a pulse duration of 250 fs. The films have been deposited at different substrate temperatures and characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy. Lastly, the film's hardness has been studied by Vickers indentation technique. The results indicate that only the films deposited at a substrate temperature of 500 • C are crystalline and formed by chromium diboride, together with a certain amount of boron and chromium, which suggests that, as main mechanism, a process taking place on the surface from atoms and ions from the gas phase. This hypothesis has been confirmed by the study of the plasma produced by the ablation process.needed particular requirements for the experimental apparatus [4]. In the case of the layers produced by conversion method, a mixture of CrB and CrB 2 was obtained [18]. On the other hand, Pulsed Laser Deposition (PLD) is not only a quite simple physical deposition technique which, in general, does not require a post annealing treatment or the presence of a buffer gas, but it has already been successfully applied to the production of metal borides thin films. Indeed, the boride films produced by PLD showed a very high hardness. In particular, super-hard films have been obtained for RhB 2 [19], ZrB 2 [20], ruthenium, rhodium, and iridium borides [21][22][23]. In all cases the films were stoichimetric and only in the case of ZrB 12 ablation biphasic films were obtained [24]. All those PLD experiments were performed by ultra-short pulse lasers, with the further advantage of obtaining nano-structured films, a peculiar characteristic of fs PLD [25], which often contributes to increase the films hardness. For these reasons ultra-shot PLD technique can be considered a suitable candidate for the deposition of chromium boride films.The aim of this paper was to study the possibility to obtain chromium boride films in vacuum by ablating a target formed by mixed powders of boron and chromium utilizing an ultra short pulse laser. Considering the characteristics of the films deposited by fs PLD, our intention was to deposit nanostructured films and to verify the ablation-deposition mechanism for the boron-chromium system. Therefore, in this paper, chromium diboride-rich thin films have been obtained by PLD, using a laser source with a pulse duration of 250 fs. The use of a stoichiometric target (B/Cr molar ratio of 2:1) gave no results, likely due to a loss of boron, so a boron rich target (B/Cr molar ratio of 4:1) has been used for further experiments. Composition, morphology and crystallinity of the films have been characterized by different techniques and their hardness has been measured by the V...

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Structure and properties of Cr–B, Cr–B–N and multilayer Cr–B/Cr–B–N thin films prepared by r.f.-sputtering

Cited by 41 publications

References 18 publications

Effect of nitrogen-incorporation on structure, properties and performance of magnetron sputtered CrB2

Effect of nitrogen-incorporation on structure, properties and performance of magnetron sputtered CrB2

Structure and Properties of Hard Nanostructured Coatings in Cr-B-N System

Femtosecond Pulsed Laser Deposition of Chromium Diboride-Rich Thin Films

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