Structure, morphology and optical properties of SiO2−x thin films prepared by plasma-assisted pulsed laser deposition

Synthesis and properties of silicon dioxide films prepared by pulsed laser deposition using ceramic SiO2 target

“…It is shown that only when the oxygenplasma-assistance was employed, the fabrication of stoichiometric SiO 2 thin films would be possible [23]. In this work, it was much easier for the deposition of stoichiometric SiO 2 thin films when CSiO 2 -Ts were used, thus eliminating the use of additional oxygenplasma-assistance.…”

“…Previously, we have investigated the deposition of SiO 2 thin films by PLD using the Si targets [23], which was very easier to yield oxygen-deficiency. It is shown that only when the oxygenplasma-assistance was employed, the fabrication of stoichiometric SiO 2 thin films would be possible [23].…”

“…According to the theoretical considerations we have proposed and discussed in the article [23], considering the absorption of the substrate and the film was free or weak in the range of 400-1200 nm wavelengths, the reflectance R and transmittance T of the film and the substrate assembly are given as follows:…”

“…4. The transmittance spectra of SiO 2 films deposited at different substratetemperatures by PLD using C-SiO 2 -T. ref [23]. Moreover, the RMS of S3 and S4 were 1.97 and 3.10 nm, respectively.…”