A general synthetic route to homoleptic indium alkoxide complexes was developed, and one of the new compounds was used as a precursor to transparent, conductive indium oxide films. The amide complex In[N-t-Bu(SiMe 3 )] 3 reacted with t-BuOH, EtMe 2 COH, Et 2 MeCOH and i-PrMe 2 COH to yield the dimers [In-(µ-OR)(OR) 2 ] 2 (R ) t-Bu, CMe 2 Et, CMeEt 2 , and CMe 2 i-Pr) in high yield. Similar reactions of In[N-t-Bu-(SiMe 3 )] 3 with the less bulky alcohols i-PrOH and Et 2 HCOH yielded, respectively, insoluble [In(O-i-Pr) 3 ] n and the tetramer In[(µ-OCHEt 2 ) 2 In(OCHEt 2 ) 2 ] 3 , which has a six-coordinate central indium atom surrounded by three four-coordinate indium atoms. The compounds [In(O-i-Pr) 3 ] n and In[(µ-OCHEt 2 ) 2 In(OCHEt 2 ) 2 ] 3 were also prepared by reacting [In(µ-O-t-Bu)(O-t-Bu) 2 ] 2 with an excess of the respective alcohols. Attempts to prepare the previously reported oxo cluster In 5 (µ 5 -O)(µ 3 -O-i-Pr) 4 (µ 2 -O-i-Pr) 4 (O-i-Pr) 5 by thermally decomposing [In(O-i-Pr) 3 ] n failed. The reaction between In[N-t-Bu(SiMe 3 )] 3 and 2,6-diisopropylphenol afforded the bis tertbutylamine adduct In(O-2,6-i-Pr 2 C 6 H 3 ) 3 (H 2 N-t-Bu) 2 . The evidence suggests that the tert-butylamine ligands in In(O-2,6-i-Pr 2 C 6 H 3 ) 3 (H 2 N-t-Bu) 2 resulted from a secondary reaction between HN-t-Bu(SiMe 3 ) and 2,6diisopropylphenol. The powerful donor p-(dimethylamino)pyridine (p-Me 2 Npy) reacted with [In(µ-O-t-Bu)-(O-t-Bu) 2 ] 2 to yield 5-coordinate In(O-t-Bu) 3 (p-Me 2 Npy) 2 and with the more sterically encumbered complex [In(µ-OCMeEt 2 )(OCMeEt 2 ) 2 ] 2 to yield four-coordinate In(OCMeEt 2 ) 3 (p-Me 2 Npy). In addition, [Inwhich has four-and six-coordinate indium centers and virtual C 2 symmetry. X-ray crystallographic studies were carried out for [In(OCMeEt 2 ) 3 (p-Me 2 Npy), and (t-BuO) 2 In(µ-O-t-Bu) 2 In(t-Bu 2 -β-diketonate) 2 . The t-amoxide complex [In(OCMe 2 Et) 3 ] 2 and oxygen were used as precursors to deposit transparent, highly conductive indium oxide films on silicon, glass, and quartz substrates at substrate temperatures of 300-500 °C in a low-pressure chemical vapor deposition process. A backscattering spectrum indicated the film deposited at 500 °C was stoichiometric In 2 O 3 (O/In ) 1.46 ( 0.07). The films were transparent in the visible region (>75%) and had resistivities as low as 9.1 × 10 -4 Ω cm. X-ray diffraction studies indicated the films deposited on glass were cubic and highly (100) oriented.