Studies of titanium dioxide film growth from titanium tetraisopropoxide

Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks

“…A conversion efficiency of TTIP into TiO 2 of 0.9 ± 0.1 is obtained. -a chemically activated regime at lower substrate temperatures, in which the growth rate follows an Arrhenius dependency with substrate temperature, independent of TTIP flow, with an apparent activation energy of 80 ± 5 kJ/mol (comparable to values reported for similar studies [30][31][32][33]). …”

Low‐Temperature Atomic Layer‐Deposited TiO2 Films with Low Photoactivity

“…As a result, ultrathin films can be uniformly formed on particle surfaces. TiO 2 ALD can be obtained most commonly using alternating exposures of titanium tetraisopropoxide (TTIP) and H 2 O or H 2 O 2 , 23–27 or using titanium tetrachloride (TiCl 4 ) and H 2 O or H 2 O 2 28,29 . The binary reaction for TiO 2 CVD reaction using TTIP and H 2 O is …”

“…This binary CVD reaction can be divided into two half‐reactions that occur solely on a surface to define TiO 2 ALD where the asterisks indicate the surface species. The by‐products are not solely in the form of isopropanol; others include acetone and propane 26,27 . Isopropanol is shown in the equation to effectively balance the reaction.…”

“…TiO 2 ALD has been demonstrated extensively on flat surfaces and more recently on particles 22–26 . The TiO 2 ALD nanocoating process on polymer particles in large quantities has not been demonstrated.…”

Synthesis of TiO2 thin films using single molecular precursors by MOCVD method for dye-sensitized solar cells application and study on film growth mechanism

“…mainly limited by the decomposition rate of precursor in the CVD growth. By evaluating the slope of this curve, on can obtained the activation energy of the deposition process to be 55.42 kJ/mol [17][18][19].…”