Study and simulation of the sputtering process of material layers in plasma

Abstract

Sputtering is characterized by a sputtering yield ratio which depends on several conditions, in particular the incident ions energy to the cathode, in normal incidence and when considers the angle α of the incident ions. Our investigations may be considered in first step to calculate the sputtering yield of three metals: copper, silver, and aluminum collide with argon, xenon, oxygen and nitrogen ions using highly developed software called SRIM (Stopping and Range of Ions in Matter) with normal incidence, then with varied angles in future works. The results obtained are compared with those obtained using the analytical models based on the Monte Carlo method proposed by researchers as Sigmund and Yamamaura in order to validate models.

Investigation using Monte-Carlo codes simulations for the impact of temperatures and high pressures on thin films quality

“…A surface atom is ejected if its energy exceeds its surface binding energy. To evaluate the number of atoms ejected under ion bombardment, we calculated the sputtering yield Y (E), which quantifies physical sputtering and is defined as the mean number of atoms removed from the surface of a solid per incident ion [2][3][4]52].…”

“…Modern technologies and their components, such as cell phones, laptops, and smartwatches, rely on cutting-edge technology to be manufactured. Therefore, they typically require small parts obtained from miniaturized wafers using thin-film technology [1][2][3][4][5].…”

“…Deposition using the sputtering approach is a complex task; it is suitable for creating a process model for acquiring the physical values of sputtering. We used a model to simulate the sputtering and transport processes, as in our previous work [1][2][3][4][5].…”

“…In Ref. [2]: The results acquired with analytical formulation primarily based on the Monte Carlo approach proposed by researchers such as Sigmund and Yamamura were compared with SRIM code simulation to validate models.…”

Electron swarm parameters of SF₆ under time varying electric fields

“…To understand the phenomena in plasma and ionized gases, we need to have an exact electron swarm parameter for various electronegative gases. Therefore, considerable attention has been consecrated to studying the physical properties of this gas [6][7][8][9][10].…”