2012
DOI: 10.1016/j.physb.2011.08.056
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Study of irradiation induced changes of electrical and functional characteristics in Ge doped Si diodes

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Cited by 3 publications
(4 citation statements)
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“…To prevent the formation of oxygen-related thermal donors and to enhance so the radiation hardness of Si material, doping with isovalent impurities of Ge can be a reasonable solution. 68,69 The slower increase of donors in Ge-doped Cz Si (GCz) material can be deduced from Fig. 27 compared to that obtained in standard Cz material.…”
Section: Table I the Ratio Of Capture Cross-section For Minority And ...mentioning
confidence: 91%
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“…To prevent the formation of oxygen-related thermal donors and to enhance so the radiation hardness of Si material, doping with isovalent impurities of Ge can be a reasonable solution. 68,69 The slower increase of donors in Ge-doped Cz Si (GCz) material can be deduced from Fig. 27 compared to that obtained in standard Cz material.…”
Section: Table I the Ratio Of Capture Cross-section For Minority And ...mentioning
confidence: 91%
“…Samples were diode structures fabricated on n-and p-type Cz Si with starting interstitial oxygen (O i ) contents ranging Effective doping, evaluated through the control of the carrier concentration, and inverse recombination lifetime as a function of isothermal annealing time in Cz and Ge-doped (GCz) Si, illustrate the formation of thermal donors. 68,69 from 7 × 10 17 to 1.1 × 10 18 cm −3 (new ASTM standard). Precipitates were formed in these samples by a 750 • C 8 h nucleation and a 975 • C 10 h anneal before p-n diode processing.…”
Section: Spectroscopy Of Defects By Temperature Dependent Carrier Lif...mentioning
confidence: 99%
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“…Changes of the relative amplitudes of TDD and V-O peaks within the O-I-DLTS spectra clearly indicate the creation of the vacancy associated complexes through the radiation induced vacancy migration. Incorporating of the isovalent impurities, such as Ge, may considerably suppress the formation of V-O centres, and the TDD density prevails then over the density of V-O complexes [10].…”
Section: Deep Level Spectramentioning
confidence: 99%