Study of Stability of Local Anodic Oxidation on HOPG and Few Layer Graphene Using AFM in Ambient

Gowthami, Thavasiappan; Gadhewal, Monika; Raina, Gargi

doi:10.1109/tnano.2013.2274900

Cited by 4 publications

(2 citation statements)

References 21 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Similarly, protrusions and trench features were observed on HOPG by Gowthami et al [133] in 2013 by LAO. They also grounded the tip and the humidity was maintained between 55% and 60%.…”

Section: Hopg: Highly Oriented Pyrolytic Graphitesupporting

confidence: 66%

Atomic and Close-to-Atomic Scale Manufacturing: A Review on Atomic Layer Removal Methods Using Atomic Force Microscopy

Mathew

Rodriguez

2020

Nanomanuf Metrol

View full text Add to dashboard Cite

Manufacturing at the atomic scale is the next generation of the industrial revolution. Atomic and close-to-atomic scale manufacturing (ACSM) helps to achieve this. Atomic force microscopy (AFM) is a promising method for this purpose since an instrument to machine at this small scale has not yet been developed. As the need for increasing the number of electronic components inside an integrated circuit chip is emerging in the present-day scenario, methods should be adopted to reduce the size of connections inside the chip. This can be achieved using molecules. However, connecting molecules with the electrodes and then to the external world is challenging. Foundations must be laid to make this possible for the future. Atomic layer removal, down to one atom, can be employed for this purpose. Presently, theoretical works are being performed extensively to study the interactions happening at the molecule–electrode junction, and how electronic transport is affected by the functionality and robustness of the system. These theoretical studies can be verified experimentally only if nano electrodes are fabricated. Silicon is widely used in the semiconductor industry to fabricate electronic components. Likewise, carbon-based materials such as highly oriented pyrolytic graphite, gold, and silicon carbide find applications in the electronic device manufacturing sector. Hence, ACSM of these materials should be developed intensively. This paper presents a review on the state-of-the-art research performed on material removal at the atomic scale by electrochemical and mechanical methods of the mentioned materials using AFM and provides a roadmap to achieve effective mass production of these devices.

show abstract

“…Similarly, protrusions and trench features were observed on HOPG by Gowthami et al [133] in 2013 by LAO. They also grounded the tip and the humidity was maintained between 55% and 60%.…”

Section: Hopg: Highly Oriented Pyrolytic Graphitesupporting

confidence: 66%

Atomic and Close-to-Atomic Scale Manufacturing: A Review on Atomic Layer Removal Methods Using Atomic Force Microscopy

Mathew

Rodriguez

2020

Nanomanuf Metrol

View full text Add to dashboard Cite

show abstract

“…We observed temporal changes in the dimensions of the etch patterns formed on HOPG using AFM voltage nanolithography in contact mode by applying a positive sample bias while the tip is grounded [27]. In this study, we investigated the evolution of the etch patterns long after lithography as a function of increasing number of nanoscale water adlayers present on the HOPG.…”

Section: Introductionmentioning

confidence: 99%

Interaction and dynamics of ambient water adlayers on graphite probed using AFM voltage nanolithography and electrostatic force microscopy

2014

Self Cite

View full text Add to dashboard Cite

In this work, we report the impact of the interaction and dynamics of increasing ambient water adlayers on etch patterns on a hydrophobic highly oriented pyrolytic graphite (HOPG) surface obtained using atomic force microscopy (AFM) voltage nanolithography in contact mode by applying a positive bias to the sample. The changes in the dimensions of the etch patterns were investigated as a function of the increasing number of water adlayers present on the HOPG, which is varied by changing the time interval since HOPG cleavage. Changes in the width of the etch patterns and the surrounding water droplets were monitored with time, using intermittent-contact-mode AFM. Electrostatic force microscopy (EFM) has been employed to study the charged nature of the etch patterns and the neighboring water film with time. The width of the etch patterns made on freshly cleaved HOPG shows an increase of ∼33% over 48 h, whereas nine-day-old cleaved HOPG shows a 79% increase over the same period. No changes in the dimensions are observed while imaging in a nitrogen atmosphere soon after lithography. In ambient conditions, the EFM phase shift of the patterns shows a large change of ∼84–88% over 30 h. This study demonstrates the effect of the stored electrostatic energy of a polarized ice-like water adlayer, resulting in changes in the dimensions of the etch patterns long after lithography, whereas liquid-like water droplets do not affect the etch patterns.

show abstract

High‐Resolution Scanning Probe Nanolithography of 2D Materials: Novel Nanostructures

Rani

Wong

2019

Adv Materials Technologies

View full text Add to dashboard Cite

Abstract2D materials have attracted tremendous research interest since the isolation of graphene. Their remarkable optical, electronic, and mechanical properties show that they hold great potential across a range of technological applications. As a result, there is a growing demand for low‐cost, low‐energy, and high‐resolution lithography methods that will enable the integration of 2D materials into complex integrated circuitry, biomedical devices, and in the generation of quantum‐confined nanostructures. Recent advances in scanning probe nanolithography (SPL) techniques for the lithography of 2D materials such as graphene, black phosphorus, molybdenum disulfide, and tungsten diselenide are discussed, including the various physiochemical aspects of subtractive and additive lithography of these materials. Examples of 2D‐material‐based devices fabricated by SPL and their properties are also described. The comparative advantages of the individual SPL techniques are discussed along with the future outlook of SPL for 2D materials.

show abstract

Study of Stability of Local Anodic Oxidation on HOPG and Few Layer Graphene Using AFM in Ambient

Cited by 4 publications

References 21 publications

Atomic and Close-to-Atomic Scale Manufacturing: A Review on Atomic Layer Removal Methods Using Atomic Force Microscopy

Atomic and Close-to-Atomic Scale Manufacturing: A Review on Atomic Layer Removal Methods Using Atomic Force Microscopy

Interaction and dynamics of ambient water adlayers on graphite probed using AFM voltage nanolithography and electrostatic force microscopy

High‐Resolution Scanning Probe Nanolithography of 2D Materials: Novel Nanostructures

Contact Info

Product

Resources

About