Study of the coupling of interlayers in compositionally modulated FeSi/Si amorphous films by conversion electron Mossbauer spectroscopy

Abstract

Abstrad Compositonally modulated FeSi/Si amorphous films with a fixed FeSi layer thickness and different Si layer thicknesses have been studied by -Fe conversion electron Masbauer spectroscopy at toom temperature. The results showed that, with decreasing Si layer thickness, the hyperfine fields of samples increased and the thickness of the interface dead layers arising from the atomic interdiffusion effect decreased. These are due to the couplingeffect between the magnetic layers. When the Si layers are thinner than 8.8 A, the direction of the magnetization is out of the film plane,