2008
DOI: 10.1016/j.tsf.2007.10.009
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Study of the hBN/InP interface by deep level transient and photoluminescence spectroscopies

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Cited by 4 publications
(2 citation statements)
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“…The presence of slow traps can be associated with the VO h-BN/GaN interface. The Dit for the slow traps related to the BN/GaN interface is comparable to the h-BN/GaN interface trap density reported elsewhere (~2×10 12 cm -2 eV -1 at EC-ET of 0.4 eV) using the PLS technique[101] on MW-PECVD deposited h-BN[91].…”
supporting
confidence: 84%
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“…The presence of slow traps can be associated with the VO h-BN/GaN interface. The Dit for the slow traps related to the BN/GaN interface is comparable to the h-BN/GaN interface trap density reported elsewhere (~2×10 12 cm -2 eV -1 at EC-ET of 0.4 eV) using the PLS technique[101] on MW-PECVD deposited h-BN[91].…”
supporting
confidence: 84%
“…xvi sample thickness, at room temperature [101]. Solid lines are the theoretical calculation using different AlN defect densities.…”
Section: Table Of Contentsmentioning
confidence: 99%